Einrichtung zur Erzeugung einer Magnetron-Entladung

DE 10234858 A UPAB: 20040326 NOVELTY - Device for producing a magnetron discharge, especially for magnetron sputtering, comprises a longitudinally extending target connected as cathode, a unit producing a magnetic field, an anode, a current supply, a substrate, a gas inlet unit and a receiver. The unit producing a magnetic field is structured so that it has a fixed position relative to the outer target limit in the region of the outer pole and has electromagnetic units in the region of the inner pole to position the center pole relative to the target according to a prescribed time program. USE - For coating substrates using magnetron sputtering. ADVANTAGE - The formation of a re-deposition zone is avoided