Einrichtung zum Beschichten von Substraten mit gekruemmter Oberflaeche durch Pulsmagnetron-Zerstaeuben

DE 10145201 C UPAB: 20021209 NOVELTY - Device for coating substrates (3) having a curved surface contains a pair of rectangular magnetron sources (1, 2) and substrate holders arranged in an evacuated chamber. The substrates are moved linearly relative to the magnetron sources during coating. The magnetron sources have tubular rotating targets having a length to diameter ratio of at least 2:1 and are arranged in a longitudinal manner to the transporting direction of the substrates. The pole lines of the magnetic central pole of the magnetron sources have a distance from each other on the target surfaces, the distance corresponding to the substrate expansion across the transporting direction. DETAILED DESCRIPTION - Preferred Features: The distance between the target centers is larger than the expansion of the substrates across the transporting direction. The energy in the magnetron sources in the form of unipolar pulses having a frequency of 10-100 kHz. USE - Used for coating substrates. ADVANTAGE - A uniform layer is produced