DE 102009015737 A1 UPAB: 20101019 NOVELTY - The magnetron coating module (100) comprises a coating source (2), a rotating target as auxiliary substrate arranged between a first coating source and a magnetron (5, 6), where the rotating target forms cathode of the magnetron, and/or a gas space divider (4) arranged between the first coating source and the coating area. The surface of the rotating target consists of carbon or carbon-containing material deposited in slight mass on a substrate (1) during sputtering. The material of the carrier is a material with slight sputtering rate. The first coating source is a planar magnetron. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for the production of a substrate with a magne...
DE 10143145 C UPAB: 20021120 NOVELTY - Production of a layer system on a substrate (2) in a vacuum d...
DE 19947935 A UPAB: 20010508 NOVELTY - Apparatus for magnetron sputtering comprises targets (1,2) su...
A turntable magnetron sputter system based on cylindrical magnetrons was used to investigate particl...
DE 10145201 C UPAB: 20021209 NOVELTY - Device for coating substrates (3) having a curved surface con...
DE 10234858 A UPAB: 20040326 NOVELTY - Device for producing a magnetron discharge, especially for ma...
WO2005059197 A UPAB: 20050725 NOVELTY - Magnetron coating installation comprises a first coating sou...
DE 10145050 C UPAB: 20021209 NOVELTY - Device for coating substrates (3) having a curved surface con...
DE 10234856 A UPAB: 20040326 NOVELTY - Coating device comprises a target and a unit producing a magn...
DE 19860474 A UPAB: 20000818 NOVELTY - Bipolar pulsed magnetron sputter coating uses program control...
The process comprises immobilizing a substrate using a substrate holder on a rotary plate, and depos...
DE1004024980 A UPAB: 20060112 NOVELTY - An arrangement for the reactive coating of objects (2) using...
DE 10311466 A UPAB: 20041027 NOVELTY - A method for rapid deposition of layers from chemical compoun...
The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the ...
Magnetron sputter coating comprises: (a) using at least two targets and a pulsed frequency of 30-100...
WO2004094686 A UPAB: 20041122 NOVELTY - Device for pulse magnetron sputtering comprises a recipient ...
DE 10143145 C UPAB: 20021120 NOVELTY - Production of a layer system on a substrate (2) in a vacuum d...
DE 19947935 A UPAB: 20010508 NOVELTY - Apparatus for magnetron sputtering comprises targets (1,2) su...
A turntable magnetron sputter system based on cylindrical magnetrons was used to investigate particl...
DE 10145201 C UPAB: 20021209 NOVELTY - Device for coating substrates (3) having a curved surface con...
DE 10234858 A UPAB: 20040326 NOVELTY - Device for producing a magnetron discharge, especially for ma...
WO2005059197 A UPAB: 20050725 NOVELTY - Magnetron coating installation comprises a first coating sou...
DE 10145050 C UPAB: 20021209 NOVELTY - Device for coating substrates (3) having a curved surface con...
DE 10234856 A UPAB: 20040326 NOVELTY - Coating device comprises a target and a unit producing a magn...
DE 19860474 A UPAB: 20000818 NOVELTY - Bipolar pulsed magnetron sputter coating uses program control...
The process comprises immobilizing a substrate using a substrate holder on a rotary plate, and depos...
DE1004024980 A UPAB: 20060112 NOVELTY - An arrangement for the reactive coating of objects (2) using...
DE 10311466 A UPAB: 20041027 NOVELTY - A method for rapid deposition of layers from chemical compoun...
The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the ...
Magnetron sputter coating comprises: (a) using at least two targets and a pulsed frequency of 30-100...
WO2004094686 A UPAB: 20041122 NOVELTY - Device for pulse magnetron sputtering comprises a recipient ...
DE 10143145 C UPAB: 20021120 NOVELTY - Production of a layer system on a substrate (2) in a vacuum d...
DE 19947935 A UPAB: 20010508 NOVELTY - Apparatus for magnetron sputtering comprises targets (1,2) su...
A turntable magnetron sputter system based on cylindrical magnetrons was used to investigate particl...