Variability phenomena in CMOS technologies have become a growing concern in recent years. One of the main reasons for this is the continued scaling of the transistor dimensions. This scaling has considerably increased the impact that these phenomena can have on different transistor parameters. Variability phenomena can be divided in two categories: Time‐Zero Variability, which occurs during the manufacturing process, and Time‐Dependent Variability, which occurs along time due to the operation of the circuits. Some Time‐Dependent Variability phenomena are caused by the trapping and detrapping of charge carriers in defects present in the transistors. In older technologies, a very high number of defects was present in each device, so that the ...
A blueprint for an atomistic approach to introducing time-dependent variability into a circuit simul...
This paper presents an innovative and automated measurement setup for the characterization of variab...
The MOS transistors of minimal gate length, universally favoured for the design of digital integrate...
Defects, both as-fabricated and generated during operation, are an inevitable reality of real-world ...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
© 1993-2012 IEEE. Advanced scaling and the introduction of new materials in the metal-oxide-semicond...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of v...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is an integral part of the electronic...
As the minimum transistor length reaches the deca-nanometer scale, both time-zero and time-dependent...
The introduction of High-κ Metal Gate transistors led to higher integration density, low leakage cur...
As the minimum transistor length reaches the deca-nanometer scale, both time-zero and time-dependent...
A blueprint for an atomistic approach to introducing time-dependent variability into a circuit simul...
This paper presents an innovative and automated measurement setup for the characterization of variab...
The MOS transistors of minimal gate length, universally favoured for the design of digital integrate...
Defects, both as-fabricated and generated during operation, are an inevitable reality of real-world ...
With the development of Very-Deep Sub-Micron technologies, process variability is becoming increasin...
© 1993-2012 IEEE. Advanced scaling and the introduction of new materials in the metal-oxide-semicond...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
As transistor dimensions are scaled down in accordance with Moore's Law to provide for improved perf...
Semiconductor technology has been scaling down at an exponential rate for many decades, yielding dra...
One of the most notable features of nanometer scale CMOS technology is the increasing magnitude of v...
Current and future semiconductor technology nodes, bring about a variety of challenges that pertain ...
The Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) is an integral part of the electronic...
As the minimum transistor length reaches the deca-nanometer scale, both time-zero and time-dependent...
The introduction of High-κ Metal Gate transistors led to higher integration density, low leakage cur...
As the minimum transistor length reaches the deca-nanometer scale, both time-zero and time-dependent...
A blueprint for an atomistic approach to introducing time-dependent variability into a circuit simul...
This paper presents an innovative and automated measurement setup for the characterization of variab...
The MOS transistors of minimal gate length, universally favoured for the design of digital integrate...