Entwicklung einer Mehrlagen-Technologie zur Herstellung von kryoelektronischen Schaltungen mittels Laserablation mit gekreuzten Plasmen Abschlussbericht

Within the project (no.: 13N63601) a novel patterning technique was developed. The technique called micro shadow mask technique give the possibility to prepare in a multilayer-HTS-device the bottom layer with beveled edges during the deposition process. The dimension of the micro shadow mask is defined by a standard photolithographic process down to a linewidth of 2 #mu#m. For the moment this method is in use only in Juelich. It will give new aspects in the preparation of SNS-ramp-type Josephson-junctions. The whole work was performed with the pulsed laser deposition using crossed flux technique. Furthermore a cryogenic laser microscope was developed at the IPM in Nishny Novgorod, builded up in ISI in the Forschungszentrum Juelich and tested successful. This microscope will be used to analyze complex HTC-devices prepared in ISI. For the improvement of rf-SQUID's multilayer thin film capacitors were realized and studied concerning the response frequency. The integration of HTC / insulator / HTC capacitors was not successful using high frequency compatible materials as an insulator. In the frame of this project the realization of such capacitors failed. (orig.)SIGLEAvailable from TIB Hannover: F97B1296+a / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekBundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany)DEGerman