Add to ORKGThe objective of this project is to fabricate linear metallic patterns based on block copolymer lith...
Unlike conventional hard programmed gate arrays, the Field Programmable Logic Array (FLPA) offers th...
Alignment patterns were exposed using a combination of optical lithography and electron beam lithogr...
Waseda University博士（工学）制度:新 ; 報告番号:甲3741号 ; 学位の種類:博士(工学) ; 授与年月日:2012/9/10 ; 早大学位記番号:新6112textdoctor...
制度:新 ; 報告番号:甲3689号 ; 学位の種類:博士(工学) ; 授与年月日:2012/9/15 ; 早大学位記番号:新6057Waseda Universit
Waseda University博士（工学）制度:新 ; 報告番号:甲3690号 ; 学位の種類:博士(工学) ; 授与年月日:2012/7/23 ; 早大学位記番号:新6058textdoctor...
Applying chemical mechanical planarization techniques to form the gate for a Cu/Ti/SiO2/Si capacitor...
A four bit microprocessor’s layout was drawn on an Apollo workstation using MOSIS two lambda design ...
A modular approach, based on work done at Sandia National Laboratories, for the monolithic integrati...
A dry etch S1O2 process was optimized using the Plasmatrac 2406 RIE etcher at RIT, while maintaining...
A study has been performed to determine the optimum surface treatment to adhere an aluminum hard mas...
Resolution capability of a GCA Mann 4800 DSW Stepper was improved using a bilayer photoresist scheme...
As device sizes reduce in size and processes become more complex, enhancement techniques for optical...
Design of sondes for in situ measurement of zooplankton or other scatterers requires choosing among...
Lattice-Boltzmann modeling was used to simulate single-phase, non-Darcy flow through flow domains co...
The objective of this project is to fabricate linear metallic patterns based on block copolymer lith...
Unlike conventional hard programmed gate arrays, the Field Programmable Logic Array (FLPA) offers th...
Alignment patterns were exposed using a combination of optical lithography and electron beam lithogr...
Waseda University博士（工学）制度:新 ; 報告番号:甲3741号 ; 学位の種類:博士(工学) ; 授与年月日:2012/9/10 ; 早大学位記番号:新6112textdoctor...
制度:新 ; 報告番号:甲3689号 ; 学位の種類:博士(工学) ; 授与年月日:2012/9/15 ; 早大学位記番号:新6057Waseda Universit
Waseda University博士（工学）制度:新 ; 報告番号:甲3690号 ; 学位の種類:博士(工学) ; 授与年月日:2012/7/23 ; 早大学位記番号:新6058textdoctor...
Applying chemical mechanical planarization techniques to form the gate for a Cu/Ti/SiO2/Si capacitor...
A four bit microprocessor’s layout was drawn on an Apollo workstation using MOSIS two lambda design ...
A modular approach, based on work done at Sandia National Laboratories, for the monolithic integrati...
A dry etch S1O2 process was optimized using the Plasmatrac 2406 RIE etcher at RIT, while maintaining...
A study has been performed to determine the optimum surface treatment to adhere an aluminum hard mas...
Resolution capability of a GCA Mann 4800 DSW Stepper was improved using a bilayer photoresist scheme...
As device sizes reduce in size and processes become more complex, enhancement techniques for optical...
Design of sondes for in situ measurement of zooplankton or other scatterers requires choosing among...
Lattice-Boltzmann modeling was used to simulate single-phase, non-Darcy flow through flow domains co...
The objective of this project is to fabricate linear metallic patterns based on block copolymer lith...
Unlike conventional hard programmed gate arrays, the Field Programmable Logic Array (FLPA) offers th...
Alignment patterns were exposed using a combination of optical lithography and electron beam lithogr...