Reflective element for EUV lithography device

A reflective optical; element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b,) prevents chemical interaction between the first additional intermediate layer (23 a,b) and the adjoining spacer layer (21) and/or the absorber layer