ZnO(:Al) layers are deposited by expanding thermal plasma (ETP) CVD inherently showing the necessary textured surface morphology required for effective light trapping resulting in a high quantum efficiency of thin film solar cells. Surface texture and morphology have been studied by AFM and SEM, optoelectronic properties are derived from spectroscopic ellipsometry combined with reflection and transmission measurements. Amorphous silicon pin solar cells and dye-sensitized cells have been deposited on top of ETP CVD deposited ZnO:Al as a front electrode. The influence of the TCO on the spectral response and the I/V characteristics show promising results