Reflektierendes Element fuer freie Elektronen Laserstrahlung, Verfahren zu seiner Herstellung uns seine Verwendung

DE 10227367 A UPAB: 20040210 NOVELTY - Reflecting element comprises a first alternating layer system having layer pairs of SiO2 and a first metal oxide or fluoride having a higher refractive index than SiO2 or two fluorides of different refractive index on a substrate with lambda /4 layer thicknesses for a wavelength interval in the region around a first wavelength lambda 2, a transition layer made from SiO2 or the first metal oxide or fluoride on the first alternating layer system, and a second alternating layer system having layer pairs of SiO2 and a second metal oxide or fluoride having a higher refractive index than SiO2 or two fluorides of different refractive index on a substrate with lambda /4 layer thicknesses for a wavelength interval in the region around a second wavelength lambda 1. The second wavelength is smaller than the first wavelength. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a process for the production of the reflecting element. USE - For adjusting an optical resonator of a free electron laser beam source (claimed). ADVANTAGE - A resonator can be quickly and easily adjusted to an operating wavelength