Fabrication of Co/Si nanowires by ultrahigh-vacuum scanning tunneling microscopy on hydrogen-passivated Si(100) surfaces

We have fabricated nanometer width Co/Si metal lines on Si(100) surfaces by ultrahigh-vacuum scanning tunneling microscopy (UHVSTM) based nanolithography on the hydrogen-passivated surface, combined with vapor deposition of Co at room temperature and subsequent annealing. The STM tip was used to define depassivated lines (<10 nm in width) by electron stimulated hydrogen desorption, and subsequently Co was deposited at a submonolayer coverage. Annealing of the substrate at 410 °C (just below hydrogen desorption) improves the structure of the wire due to silicidation, whereas the as-deposited wire is very granular (comparable to other materials in previous studies)