The ionic equilibrium of the species in the CuSO4-H2SO4-H2O system was employed to systematize the conditions of copper electrodeposition leading to the formation of the honeycomb-like structure. The reason why CuSO4 concentrations higher than 0.15 M are unsuitable for the formation of honeycomb-like structures is shown. The range of H2SO4 concentrations enabling the formation of this type of structure was also determined. The conditions leading to the formation of the honeycomb-like structures are: electrodeposition from solutions with lower concentrations of Cu(II) ions (0.15 M CuSO4 and less) in a concentration range from 0.25 to 1.0 M H2SO4, at a temperature of 18.0 +/- 1.0 degrees C and at overpotentials outside the plateau of the limi...
Electrodeposition of copper in the hydrogen co-deposition range by the regime of reversing current (...
[[abstract]]The electrodeposition nature of copper on a gold electrode in a 4.8 pH CuSO4 solution wa...
[[abstract]]©2003 Electrochem - A multi-ion deposition model, based on constant applied voltage, was...
The ionic equilibrium of the species in the CuSO4-H2SO4-H2O system was employed to systematize the c...
The ionic equilibrium of the species in the CuSO4–H2SO4–H2O system was employed to systematize the c...
The relative concentration of hydrogen ion (H(+)) as a function of sulfuric acid (H(2)SO(4)) concent...
This a review paper considering fundamental aspects of copper electrodeposition at high overpotentia...
Electrodeposition of copper from acid sulfate solutions at overpotentials on the plateau of the limi...
Electrodeposition of copper from acid sulfate solutions at overpotentials on theplateau of the limit...
In this chapter, the formation of open and porous electrodes by the constant and periodically changi...
The effect of temperature on the electrodeposition of copper at overpotentials belonging to the plat...
Abstract: Electrodeposition of copper from acid sulfate solutions at overpotentials on the plateau o...
Formation of irregular deposits by electrodeposition from acid sulfate solutions of various H2SO4 co...
Copper electrodeposition from acid sulfate solutions at an overpotential of 1000 mV, which is about ...
The influence of an inert electrolyte (sodium sulfate) on quasi-two-dimensional copper electrodeposi...
Electrodeposition of copper in the hydrogen co-deposition range by the regime of reversing current (...
[[abstract]]The electrodeposition nature of copper on a gold electrode in a 4.8 pH CuSO4 solution wa...
[[abstract]]©2003 Electrochem - A multi-ion deposition model, based on constant applied voltage, was...
The ionic equilibrium of the species in the CuSO4-H2SO4-H2O system was employed to systematize the c...
The ionic equilibrium of the species in the CuSO4–H2SO4–H2O system was employed to systematize the c...
The relative concentration of hydrogen ion (H(+)) as a function of sulfuric acid (H(2)SO(4)) concent...
This a review paper considering fundamental aspects of copper electrodeposition at high overpotentia...
Electrodeposition of copper from acid sulfate solutions at overpotentials on the plateau of the limi...
Electrodeposition of copper from acid sulfate solutions at overpotentials on theplateau of the limit...
In this chapter, the formation of open and porous electrodes by the constant and periodically changi...
The effect of temperature on the electrodeposition of copper at overpotentials belonging to the plat...
Abstract: Electrodeposition of copper from acid sulfate solutions at overpotentials on the plateau o...
Formation of irregular deposits by electrodeposition from acid sulfate solutions of various H2SO4 co...
Copper electrodeposition from acid sulfate solutions at an overpotential of 1000 mV, which is about ...
The influence of an inert electrolyte (sodium sulfate) on quasi-two-dimensional copper electrodeposi...
Electrodeposition of copper in the hydrogen co-deposition range by the regime of reversing current (...
[[abstract]]The electrodeposition nature of copper on a gold electrode in a 4.8 pH CuSO4 solution wa...
[[abstract]]©2003 Electrochem - A multi-ion deposition model, based on constant applied voltage, was...