Includes bibliographical references (pages 39-41)In this project, a physics-based analytical model for silicon carbide (SiC) metal semiconductor field effect transistors (MESFETs) has been developed and presented. The gate capacitances such as gate-source capacitance and gate-drain capacitance were determined by considering various terminal charges with respect to the voltages at source, drain, and gate. The gate capacitance has been determined for linear and non-linear regions. This study is extremely valuable for SiC MESFETs to find their cut-off and maximum frequencies from the gate capacitance model. The gate-source and gate-drain capacitances show extremely attractive values, justifying the use of SiC MESFET as a high frequency device
SiC MESFETs have been designed, simulated, fabricated and characterized for high power, high frequen...
The potential of silicon carbide (SiC) MESFETs for high frequency applications are investigated by a...
Silicon carbide (SiC) is considered the most promising material for next-generation power semiconduc...
Includes bibliographical references (pages 41-45)In this research project as a graduate thesis, a ph...
Includes bibliographical references (pages 44-50)This study concentrates on analytical modeling of s...
Includes bibliographical references (pages 33-35)This project presents a development of variance cap...
Capacitance-voltage (C-V) gate characteristics of power metal-oxide-semiconductor field-effect trans...
Includes bibliographical references (leaves 46-53)In this paper, we report an analytical modeling an...
Includes bibliographical references (pages 45-50)In this project, we report scaling the analytical m...
Includes bibliographical references (pages 42-44)This project presents an improved analytical model ...
Includes bibliographical references (leaves 66-69)TCAD simulation of ion implanted silicon carbide M...
Silicon Carbide (SiC) has been investigated as an alternative material to Silicon (Si) for enhancing...
Includes bibliographical references (pages 44-49)In this project, an analytical modeling of Gallium ...
Includes bibliographical references (pages 47-49)The ion implantation based analytical model of subm...
SiC MESFETs have been designed, simulated, fabricated and characterized for high power, high frequen...
SiC MESFETs have been designed, simulated, fabricated and characterized for high power, high frequen...
The potential of silicon carbide (SiC) MESFETs for high frequency applications are investigated by a...
Silicon carbide (SiC) is considered the most promising material for next-generation power semiconduc...
Includes bibliographical references (pages 41-45)In this research project as a graduate thesis, a ph...
Includes bibliographical references (pages 44-50)This study concentrates on analytical modeling of s...
Includes bibliographical references (pages 33-35)This project presents a development of variance cap...
Capacitance-voltage (C-V) gate characteristics of power metal-oxide-semiconductor field-effect trans...
Includes bibliographical references (leaves 46-53)In this paper, we report an analytical modeling an...
Includes bibliographical references (pages 45-50)In this project, we report scaling the analytical m...
Includes bibliographical references (pages 42-44)This project presents an improved analytical model ...
Includes bibliographical references (leaves 66-69)TCAD simulation of ion implanted silicon carbide M...
Silicon Carbide (SiC) has been investigated as an alternative material to Silicon (Si) for enhancing...
Includes bibliographical references (pages 44-49)In this project, an analytical modeling of Gallium ...
Includes bibliographical references (pages 47-49)The ion implantation based analytical model of subm...
SiC MESFETs have been designed, simulated, fabricated and characterized for high power, high frequen...
SiC MESFETs have been designed, simulated, fabricated and characterized for high power, high frequen...
The potential of silicon carbide (SiC) MESFETs for high frequency applications are investigated by a...
Silicon carbide (SiC) is considered the most promising material for next-generation power semiconduc...