Semiconductor technology has gone through several decades of aggressive scaling. The ever shrinking size of both transistors and interconnects is necessitating the interaction between the circuit designers and the foundries that fabricate the IC products. In particular, the designers must take into account the impact of the process variability early in the design stage. This includes both the verification and optimization of the circuit with statistical models characterizing the process variability. This thesis advances three frontiers in the variability-aware design flow. Yield estimation is a crucial but expensive verification step in circuit design. Existing methods either suffer from computationally intensive rare event probability calc...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract The dimension of transistors shrinks with each new technology developed in the semiconducto...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
Semiconductor technology has gone through several decades of aggressive scaling. The ever shrinking ...
As device feature sizes shrink to nano-scale, continuous technology scaling has led to a large incre...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
Vita.This dissertation deals with both theoretical and practical aspects of integrated circuits (IC'...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
This book targets custom IC designers who are encountering variation issues in their designs, especi...
With the continuous downscaling of CMOS technology, precise control over process parameters has beco...
Integrated circuits have to be robust to manufacturing variations. This paper presents a new statist...
Today's IC design is facing several challenges due to increasing circuit complexity and decreasing f...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
The dimension of transistors shrinks with each new technology developed in the semiconductor industr...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract The dimension of transistors shrinks with each new technology developed in the semiconducto...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...
Semiconductor technology has gone through several decades of aggressive scaling. The ever shrinking ...
As device feature sizes shrink to nano-scale, continuous technology scaling has led to a large incre...
DoctorAs technology node shrinks, process variation (PV) becomes a major concern in circuit design. ...
Vita.This dissertation deals with both theoretical and practical aspects of integrated circuits (IC'...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
Scaling of CMOS technology into the deep-submicron regime has made superior device performance and h...
This book targets custom IC designers who are encountering variation issues in their designs, especi...
With the continuous downscaling of CMOS technology, precise control over process parameters has beco...
Integrated circuits have to be robust to manufacturing variations. This paper presents a new statist...
Today's IC design is facing several challenges due to increasing circuit complexity and decreasing f...
Aggressive device scaling has made it imperative to account for process variations in the design flo...
The dimension of transistors shrinks with each new technology developed in the semiconductor industr...
textAs device geometries shrink, variability of process parameters becomes pronounced, resulting in ...
Abstract The dimension of transistors shrinks with each new technology developed in the semiconducto...
With technology scaling down to 90nm and below, process variation has become a primary challenge for...