Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;subgt;4lt;/subgt; with varying silicon contents were deposited on silicon and stainless steel (SS 304) substrates by reactive direct current (DC) unbalanced magnetron sputtering. An asymmetric bipolar-pulsed DC power supply and a DC power supply were used to sputter Si and Ti targets, respectively in Ar+Nlt;subgt;2lt;/subgt; plasma. Structural characterization of the coatings was done using X-ray diffraction (XRD). The bonding structure of the nanocomposite coatings was characterized by X-ray photoelectron spectroscopy (XPS). The elemental composition of the TiN/Silt;subgt;3lt;/subgt;Nlt;subgt;4lt;/subgt; nanocomposite coatings was determined ...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Nanocomposite coatings of CrN/Si3N4 and CrAlN/Si3N4 with varying silicon contents were synthesized u...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Nanocomposite coatings of CrN/Si3N4 and CrAlN/Si3N4 with varying silicon contents were synthesized u...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Nanocomposite coatings of CrN/Si3N4 and CrAlN/Si3N4 with varying silicon contents were synthesized u...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...