Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputtering as a function of Ti metal content. Structural and microstructural characterizations of the as-deposited coatings were carried out using X-ray diffraction and field emission scanning microscopy. Nano-mechanical properties of the coatings were evaluated using nanoindentation, scratch and wear testing techniques. It was observed that nano-hardness and elastic modulus of the coatings decreased with an increase in Ti content. The H/E ratio, an indicator of wear resistance, was found to vary from 0.074 to 0.101 for the coatings with low Ti content. A linear increase in fracture toughness from 1.19 to 2.75 MPa.m1/2 with increasing Ti content wa...
A dual ion beam system has been used to produce hard nanocomposite TiN/Si3N4 coatings on silicon sub...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
TiN-based nanocomposite coatings were prepared using physical vapor deposition to deliver enhanced m...
Physical or chemical vapor deposited nanocomposite thin films evoke much scientific interest due to ...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
TiN-based nanocomposite coatings were prepared using physical vapor deposition to deliver enhanced m...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Iron-rich nanocomposite Fe-Ti-N coatings are deposited by reactive direct-current magnetron sputteri...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
A dual ion beam system has been used to produce hard nanocomposite TiN/Si3N4 coatings on silicon sub...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
Nanocrystalline titanium nitride (TiN) coatings were deposited on Si (100) substrates using reactive...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
TiN-based nanocomposite coatings were prepared using physical vapor deposition to deliver enhanced m...
Physical or chemical vapor deposited nanocomposite thin films evoke much scientific interest due to ...
Superhard nanocomposite coatings of TiN/a-C were prepared on silicon (111) and M3 tool steel substra...
TiN-based nanocomposite coatings were prepared using physical vapor deposition to deliver enhanced m...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
Iron-rich nanocomposite Fe-Ti-N coatings are deposited by reactive direct-current magnetron sputteri...
Single layer TiN coatings were prepared on silicon (111) substrates using a multi-target reactive DC...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
A dual ion beam system has been used to produce hard nanocomposite TiN/Si3N4 coatings on silicon sub...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...