Nanocomposite coatings of CrN/Si3N4 and CrAlN/Si3N4 with varying silicon contents were synthesized using a reactive direct current (DC)unbalanced magnetron sputtering system. The Cr and CrAl targets were sputtered using a DC power supply and the Si target was sputtered using an asymmetric bipolar-pulsed DC power supply, in Ar+N2 plasma. The coatings were approximately 1.5 μm thick and were characterized using X-ray diffraction (XRD), nanoindentation, X-ray photoelectron spectroscopy and atomic force microscopy. Both the CrN/Si3N4 and CrAlN/Si3N4 nanocomposite coatings exhibited cubic B1 NaCl structure in the XRD data, at low silicon contents (b9 at.%). A maximum hardness and elastic modulus of 29 and 305 GPa, respectively were obtained fro...
Silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering....
Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates...
Nanocomposite Cr–Si–N films were prepared on to Ti–6Al–4V substrates by a novel duplex surface treat...
Single-phase CrN and CrAlN coatings were deposited on silicon and mild steel substrates using a reac...
Nanocomposite coatings of Cr-Si3N4 exhibiting low friction and high toughness were prepared on plasm...
Approximately 1.5 x3BC;m thick CrN and CrAlN coatings were deposited on silicon and mild steel subst...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Sintered targets with mixed Cr and Si (10, 20, 30, 35 and 40 at. %) elemental powders were sputtered...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
The present work deals with structural, mechanical and tribological characterization of nanostructur...
Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive...
202310 bcvcVersion of RecordOthersCity University of Hong Kong; Department of Mechanical Engineering...
AbstractWe investigated the mechanical and physicochemical properties of CrN/Si3N4 multilayered coat...
Herein, the closed field unbalanced magnetron sputtered CrNiN, CrNiSiN, and CrNiAlN coatings are stu...
Silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering....
Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates...
Nanocomposite Cr–Si–N films were prepared on to Ti–6Al–4V substrates by a novel duplex surface treat...
Single-phase CrN and CrAlN coatings were deposited on silicon and mild steel substrates using a reac...
Nanocomposite coatings of Cr-Si3N4 exhibiting low friction and high toughness were prepared on plasm...
Approximately 1.5 x3BC;m thick CrN and CrAlN coatings were deposited on silicon and mild steel subst...
Superhard nanocomposite coatings of TiAlN/Si3N4 with varying silicon contents were synthesized using...
Sintered targets with mixed Cr and Si (10, 20, 30, 35 and 40 at. %) elemental powders were sputtered...
Approximately 1.5-amp;mu;m-thick superhard nanocomposite coatings of TiN/Silt;subgt;3lt;/subgt;Nlt;s...
This project involves the deposition of superhard nanocomposite coatings of TiN/Si3N4 using unbalanc...
The present work deals with structural, mechanical and tribological characterization of nanostructur...
Chromium nitride and silicon doped chromium nitride thin films have been deposited by r.f. reactive...
202310 bcvcVersion of RecordOthersCity University of Hong Kong; Department of Mechanical Engineering...
AbstractWe investigated the mechanical and physicochemical properties of CrN/Si3N4 multilayered coat...
Herein, the closed field unbalanced magnetron sputtered CrNiN, CrNiSiN, and CrNiAlN coatings are stu...
Silicon doped chromium nitride thin films have been deposited by r.f. reactive magnetron sputtering....
Chromium nitride (CrN) thin films were deposited at room temperature on silicon and glass substrates...
Nanocomposite Cr–Si–N films were prepared on to Ti–6Al–4V substrates by a novel duplex surface treat...