We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mixed oxide (AlxTiyOz) films and Al2O3/TiO2 nanolaminates (75 and 200 nm). Using bulge and microelectromechanical system shaft-loading techniques, we evaluated the Young’s modulus, residual stress and ultimate tensile stress of these films and laminates. Fits to the load–displacement curves provided estimates for the residual stress and Young’s modulus. We extracted a residual stress of 347–403 MPa for Al2O3, 365–389 MPa for AlxTiyOz and 450–455 MPa for the nanolaminate. The Young’s modulus was 164–165 GPa for Al2O3, 151–154 GPa for mixed oxide and 148–169 GPa for the nanolaminate. Thin membranes exhibited an ultimate tensile strength of 1.57–2...
A continuous, dense aluminum oxide (Al2O3) layer of about 5 nm forms on the surface of Al alloys upo...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
A continuous, dense aluminum oxide (Al2O3) layer of about 5 nm forms on the surface of Al alloys upo...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
Atomic layer deposition (ALD) is based on self-limiting surface reactions. This and cyclic process e...
A continuous, dense aluminum oxide (Al2O3) layer of about 5 nm forms on the surface of Al alloys upo...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...