Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems (MEMS) due to their excellent properties: ALD films are conformal, uniform, dense, and pin-hole free. The main requirement for any film to be applied in MEMS is to exhibit good mechanical properties. Good mechanical properties mean that film has low residual stress, high fracture and interfacial strengths, and known elastic properties under applied mechanical load. MEMS devices are often subjected to the environmental stress. Therefore, it is important to evaluate mechanical properties also after environmental stress conditions. In this doctoral dissertation, the mechanical properties of ALD thin films are evaluated by means of bulge and MEMS...
ALD technique (ALD = atomic layer deposition) offers thin films with properties that complement thos...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
The mechanical properties of ultrathin films synthesized by atomic layer deposition (ALD) are critic...
ALD technique (ALD = atomic layer deposition) offers thin films with properties that complement thos...
ALD technique (ALD = atomic layer deposition) offers thin films with properties that complement thos...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...
Atomic layer deposited (ALD) films have become essential for various microelectromechanical systems ...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
We assessed mechanical properties of free-standing atomic-layer-deposited (ALD) Al2O3 thin films, mi...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
Use of atomic layer deposition (ALD) in microelectromechanical systems (MEMS) has increased as ALD e...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
We have investigated elastic and fracture properties of amorphous Al2O3 thin films deposited by atom...
The mechanical properties of ultrathin films synthesized by atomic layer deposition (ALD) are critic...
ALD technique (ALD = atomic layer deposition) offers thin films with properties that complement thos...
ALD technique (ALD = atomic layer deposition) offers thin films with properties that complement thos...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...
Layers manufactured by the ALD technique have many interesting applications in microelectromechanica...