session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)International audienceWe present for the first time an experimental study of thermal effects in 3D sequential integration, including Self-Heating Effect (SHE) and thermal coupling between the two levels of ultra-thin body FDSOI transistors. We extracted a large set of experimental data using different thermometry techniques, and different heater-sensor configurations allowed by this specific stacked integration. We described SHE in top and bottom transistor levels, as well as the influence of a transistor in ON state on a transistor stacked above or below. At the same time, we provide for the first time an experimental validation that the temperature i...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
The microelectronic industry is in transition. At the device level, short-channel issues have led to...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
Devido às dimensões cada vez mais reduzidas dos transistores e a utilização de novos materiais com b...
Devido às dimensões cada vez mais reduzidas dos transistores e a utilização de novos materiais com b...
Abstract—In this work self-heating and its effect on device parameters are compared in 28 nm technol...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
The microelectronic industry is in transition. At the device level, short-channel issues have led to...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
Devido às dimensões cada vez mais reduzidas dos transistores e a utilização de novos materiais com b...
Devido às dimensões cada vez mais reduzidas dos transistores e a utilização de novos materiais com b...
Abstract—In this work self-heating and its effect on device parameters are compared in 28 nm technol...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
session: Modeling and CharacterizationInternational audienceWe present an experimental study of ther...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...
The systematically growing power (heat) dissipation in CMOS transistors with each successive technol...