This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by two different spacings. Through DC measurements, the temperature increase experienced by a device due to the self-heating of a neighbor one is estimated by making a comparison with hot chuck measurements. The degradation of electrical parameters caused by the operation (i.e. heating) of the neighbor device is also analyzed as a function of the bias applied to (i.e. power dissipated by) the neighbor device
Self-heating is an important issue for SOI CMOS, and hence, so is its characterization and modeling....
In this work self-heating and its effect on device parameters are compared in 28 nm technology bulk ...
Pulsed measurements are used to investigate self-heating in strained-Si MOSFETs. From analysis of th...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
This paper proposes an original approach to separately characterize self-heating and substrate effec...
This paper proposes an original approach to separately characterize self-heating and substrate effec...
A current mirror is proposed as a suitable structure for the characterization of layout dependent th...
In this paper, it is shown that self-heating causes a gigantic effect on the capacitances of MOSFETs...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
This paper studies the influence of self-heating on the physical properties of SOI MOSFETs through t...
This paper examines the influence of the static and dynamic electrothermal behaviour of silicon-on-i...
Self-heating is an important issue for SOI CMOS, and hence, so is its characterization and modeling....
In this work self-heating and its effect on device parameters are compared in 28 nm technology bulk ...
Pulsed measurements are used to investigate self-heating in strained-Si MOSFETs. From analysis of th...
This work studies the thermal cross-coupling between two side-by-side FD-SOI MOSFETs separated by tw...
This paper proposes an original approach to separately characterize self-heating and substrate effec...
This paper proposes an original approach to separately characterize self-heating and substrate effec...
A current mirror is proposed as a suitable structure for the characterization of layout dependent th...
In this paper, it is shown that self-heating causes a gigantic effect on the capacitances of MOSFETs...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
session 7: Characterization, Reliability, and Yield: Reliability of Advanced Devices (7.6)Internatio...
This paper studies the influence of self-heating on the physical properties of SOI MOSFETs through t...
This paper examines the influence of the static and dynamic electrothermal behaviour of silicon-on-i...
Self-heating is an important issue for SOI CMOS, and hence, so is its characterization and modeling....
In this work self-heating and its effect on device parameters are compared in 28 nm technology bulk ...
Pulsed measurements are used to investigate self-heating in strained-Si MOSFETs. From analysis of th...