Ta2O5 films deposited by ion beam sputtering were post-treated with different methods. The optical properties, microstructures, surface morphologies, absorption and laser-induced damage threshold (LIDT) at 1064 nm and 12 ns of the films were comparatively studied. Annealing conduced to larger changes of optical transmittance and surface morphologies whereas it led to smaller changes of absorption and LIDT than laser conditioning. As it was shown, all the three post-treatment methods in this study were beneficial to the laser damage resistance of the films, yet the details of the defect elimination caused by these methods were different. A defect evolution model was proposed, which revealed the different effects of post-treatment methods on ...
Thin polycrystalline films of Ta2O5 having high chemical resistance and large dielectric permittivit...
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。文中对SiO2保护层和退火对Ta2O5薄膜的激光损伤阈值的不同影响进行了研究。结果表明,SiO2保护层不会影响薄膜内的电场分布,薄膜微结构和微...
Tantalum oxide (TaOx) films were deposited by KrF excimer laser ablation of Ta2O5 targets in an oxyg...
Ta2O5 films are prepared on Si, BK7, fused silica, antireflection (AR) and high reflector (HR) subst...
Ta2O5 films were deposited using the conventional electron beam evaporation method and then annealed...
Ta2O5 films are deposited on fused silica substrates by conventional electron beam evaporation metho...
Ta2O5 films were prepared by electron beam evaporation under different oxygen partial pressures. Thr...
Ta2O5 films were deposited by conventional electron beam evaporation method and then annealed in air...
High laser-induced damage threshold (LIDT)Ta2O5 films were prepared by the sol-gel method using TaCl...
Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressi...
Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressi...
Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due...
A series or Ta2O5 films with different SiO2 additional layers including overcoat, undercoat and inte...
In this study, multilayer Ta2O5/SiO2 and HfO2/SiO2 films were deposited on glass substrates by ion b...
Ta2O5膜采用传统的电子束蒸发方法制备,并在氧气中673 K的条件下进行了退火12 h处理。首先在1-on-1体系下对Ta2O5膜进行了532和1064 nm波长下的激光损伤阈值(LIDT) 研究,...
Thin polycrystalline films of Ta2O5 having high chemical resistance and large dielectric permittivit...
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。文中对SiO2保护层和退火对Ta2O5薄膜的激光损伤阈值的不同影响进行了研究。结果表明,SiO2保护层不会影响薄膜内的电场分布,薄膜微结构和微...
Tantalum oxide (TaOx) films were deposited by KrF excimer laser ablation of Ta2O5 targets in an oxyg...
Ta2O5 films are prepared on Si, BK7, fused silica, antireflection (AR) and high reflector (HR) subst...
Ta2O5 films were deposited using the conventional electron beam evaporation method and then annealed...
Ta2O5 films are deposited on fused silica substrates by conventional electron beam evaporation metho...
Ta2O5 films were prepared by electron beam evaporation under different oxygen partial pressures. Thr...
Ta2O5 films were deposited by conventional electron beam evaporation method and then annealed in air...
High laser-induced damage threshold (LIDT)Ta2O5 films were prepared by the sol-gel method using TaCl...
Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressi...
Optical coatings deposited by the dual ion beam sputtering (DIBS) method usually show high compressi...
Ion beam sputtering is one of the widely used methods for manufacturing laser optical components due...
A series or Ta2O5 films with different SiO2 additional layers including overcoat, undercoat and inte...
In this study, multilayer Ta2O5/SiO2 and HfO2/SiO2 films were deposited on glass substrates by ion b...
Ta2O5膜采用传统的电子束蒸发方法制备,并在氧气中673 K的条件下进行了退火12 h处理。首先在1-on-1体系下对Ta2O5膜进行了532和1064 nm波长下的激光损伤阈值(LIDT) 研究,...
Thin polycrystalline films of Ta2O5 having high chemical resistance and large dielectric permittivit...
Ta2O5薄膜采用传统的电子束蒸发方法沉积在BK7基底上。文中对SiO2保护层和退火对Ta2O5薄膜的激光损伤阈值的不同影响进行了研究。结果表明,SiO2保护层不会影响薄膜内的电场分布,薄膜微结构和微...
Tantalum oxide (TaOx) films were deposited by KrF excimer laser ablation of Ta2O5 targets in an oxyg...