The Coulomb oscillations based on band-to-band tunneling through a valence band in silicon metal-oxide-semiconductor field-effect-transistors were discussed. It was found that the formation of tunnel barries and a quantum dot in a single-electron transistor structure originated from two p+ - p+ tunnel junctions and a p+ -doped channel with mesoscopic dimension, respectively. At liquid nitrogen temperature, the Coulomb-blockade oscillations with multiple peaks were also observed. Analysis shows that the single-electron charging effect based on band-to-band tunneling was confirmed using the electrical and thermal characterization of the quantum dots.open2
For the purpose of controllable characteristics, silicon single-electron tunneling transistors with ...
We report measurements on submicron metal-oxide-semiconductor field effect transistors equipped with...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
Novel metal-oxide-semiconductor (MOS)-based single-electron transistors (MOSETs) using band-to-band ...
The scaling of Silicon (Si) technology is approaching the physical limit, where various quantum effe...
[[abstract]]Ultrathin oxide-gated (thickness ~6 nm) point-contact junctions have been fabricated to...
In this letter we report single-hole tunneling through a quantum dot in a two-dimensional hole gas, ...
Coulomb blockade has been observed in the current-voltage characteristics of structures fabricated i...
Abstract—A two-dimensional Si multidot channel field-effect transistor is fabricated from a silicon-...
Abstract—A two-dimensional Si multidot channel field-effect transistor is fabricated from a silicon-...
Single charge electronics offer a way for disruptive technology in nanoelectronics. Coulomb blockade...
Contains a description of one research project, a report on one research project and a list of publi...
Silicon single electron transistors were fabricated by using the highly doped silicon channel with d...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
For the purpose of controllable characteristics, silicon single-electron tunneling transistors with ...
We report measurements on submicron metal-oxide-semiconductor field effect transistors equipped with...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
Novel metal-oxide-semiconductor (MOS)-based single-electron transistors (MOSETs) using band-to-band ...
The scaling of Silicon (Si) technology is approaching the physical limit, where various quantum effe...
[[abstract]]Ultrathin oxide-gated (thickness ~6 nm) point-contact junctions have been fabricated to...
In this letter we report single-hole tunneling through a quantum dot in a two-dimensional hole gas, ...
Coulomb blockade has been observed in the current-voltage characteristics of structures fabricated i...
Abstract—A two-dimensional Si multidot channel field-effect transistor is fabricated from a silicon-...
Abstract—A two-dimensional Si multidot channel field-effect transistor is fabricated from a silicon-...
Single charge electronics offer a way for disruptive technology in nanoelectronics. Coulomb blockade...
Contains a description of one research project, a report on one research project and a list of publi...
Silicon single electron transistors were fabricated by using the highly doped silicon channel with d...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...
For the purpose of controllable characteristics, silicon single-electron tunneling transistors with ...
We report measurements on submicron metal-oxide-semiconductor field effect transistors equipped with...
We fabricated highly doped Si single-electron transistors (SETs) with a series of geometrically defi...