Add to ORKGInsight into the growth mechanism of plasma deposited materials is essential for full optimization of the deposition process and improvement of the material properties of the deposited films. The complexity of the deposition process requires knowledge on the different aspects of plasma deposition. This means that in addition to measurements of the gas phase densities of the plasma species, also experiments on the species’ surface reactivity are required as well as on the nature of the surface during film growth. In the following sections, some studies concerning these three different aspects will be shortly reviewed. It will be concentrated on the technologically very relevant deposition processes of a-Si:H and a-SiNx:H, which are both kn...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
\u3cp\u3eFrom investigations on the SiH\u3csub\u3e3\u3c/sub\u3e and SiH radical density and the surf...
Despite the widespread use of low-temperature plasmas for deposition and erosion of thin films and s...
Insight into the growth mechanism of plasma deposited materials is essential for full optimization o...
Insight into the growth mechanism of plasma deposited materials is essential for full optimization o...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Insight into the interaction between plasma and the surface can be obtained from well-defined radica...
The optical emission intensities of the reactive species, Si (288 nm), SiH (414 nm), and H (434, 486...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
\u3cp\u3eFrom investigations on the SiH\u3csub\u3e3\u3c/sub\u3e and SiH radical density and the surf...
Despite the widespread use of low-temperature plasmas for deposition and erosion of thin films and s...
Insight into the growth mechanism of plasma deposited materials is essential for full optimization o...
Insight into the growth mechanism of plasma deposited materials is essential for full optimization o...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Plasma and in situ film studies have been applied to the expanding thermal plasma toobtain basic ins...
Insight into the interaction between plasma and the surface can be obtained from well-defined radica...
The optical emission intensities of the reactive species, Si (288 nm), SiH (414 nm), and H (434, 486...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
From investigations on the SiH3 and SiH radical density and the surface reaction probability in a re...
\u3cp\u3eFrom investigations on the SiH\u3csub\u3e3\u3c/sub\u3e and SiH radical density and the surf...
Despite the widespread use of low-temperature plasmas for deposition and erosion of thin films and s...