In order to understand the variation of the barrier height of different metal-semiconductor contacts, a model for common effective contact (CEC) was proposed. The CEC consists of several primary diodes prepared or formed by different metals on the same semiconductor substrate. The smallest interfacial area of each primary diode was assumed to be the smallest limitation of area on which the Schottky contact's properties exist. The results of the investigation show that all electrical properties - the barrier height especially - of the CEC depend on the ratio of the interfacial area occupied by each metal component in the common effective interface. This result may be applied to the metal compound-semiconductor contact to investigate the var...
Structures on the base of Schottky barriers with the small length of depletion are investigated in t...
In this work, barrier height inhomogeneity and its origin are investigated for Au and Cu/n-InP metal...
The description of the metal semiconductor contact in the framework of the general model incorporati...
In order to understand the variation of the barrier height of different metal-semiconductor contacts...
A theoretical analysis is presented for the combination of stoichiometry changes within a metal cont...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
[[abstract]]The authors studied the Schottky barrier for several metal-semiconductor interfaces usin...
Abstract-By reconsidering the effect of the penetration depth of the interface states, a new analyti...
The profile of the energy bands of a semiconductor in contact with a metal is determined by the inte...
The description of the electronic structure of an interface between two materials is one of the main...
The description of the electronic structure of an interface between two materials is one of the main...
Recently there has been considerable interest in the pressure dependence of barrier heights of metal...
Recently there has been considerable interest in the pressure dependence of barrier heights of metal...
Structures on the base of Schottky barriers with the small length of depletion are investigated in t...
In this work, barrier height inhomogeneity and its origin are investigated for Au and Cu/n-InP metal...
The description of the metal semiconductor contact in the framework of the general model incorporati...
In order to understand the variation of the barrier height of different metal-semiconductor contacts...
A theoretical analysis is presented for the combination of stoichiometry changes within a metal cont...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
The physical principles underlying the metal-semiconductor barrier are discussed in the light of rec...
[[abstract]]The authors studied the Schottky barrier for several metal-semiconductor interfaces usin...
Abstract-By reconsidering the effect of the penetration depth of the interface states, a new analyti...
The profile of the energy bands of a semiconductor in contact with a metal is determined by the inte...
The description of the electronic structure of an interface between two materials is one of the main...
The description of the electronic structure of an interface between two materials is one of the main...
Recently there has been considerable interest in the pressure dependence of barrier heights of metal...
Recently there has been considerable interest in the pressure dependence of barrier heights of metal...
Structures on the base of Schottky barriers with the small length of depletion are investigated in t...
In this work, barrier height inhomogeneity and its origin are investigated for Au and Cu/n-InP metal...
The description of the metal semiconductor contact in the framework of the general model incorporati...