In current technologies (65nm and beyond), functional failures caused by shorts, opens, and stuck-at faults do not seem to be the main issues; instead, timing related parametric failures are on the rise and are expected to increase as technology further scales [1]. This leads to increased yield loss and escape and reduced reliability. As a result, at-speed test is a requirement for nanometer technology designs to target timing-related failures. Structural at-speed tests, scan-based transition delay fault (TDF) and path delay fault (PDF) tests, are widely adopted because of their low implementation cost and high test coverage [2]. However, as circuit complexity and functional frequency increase, the test power consumption, supply voltage noi...
Timing-related defects are becoming increasingly impor-tant in nanometer technology designs. Small d...
Timing-related defects are major contributors to test escapes and in-field reliability problems for ...
textThe rapidly evolving process technologies and device complexity that have fueled the exponentia...
In current technologies (65nm and beyond), functional failures caused by shorts, opens, and stuck-at...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
To meet the market demand, next generation of technology appears with increasing speed and performan...
To meet the market demand, next generation of technology appears with increasing speed and performan...
To meet the market demand, next generation of technology appears with increasing speed and performan...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The scaling of fabrication technology not only provides us higher integration and enhanced performan...
<p>Timing-related defects are becoming increasingly important in nanometer-technology integrated cir...
Timing-related defects are becoming increasingly impor-tant in nanometer technology designs. Small d...
Timing-related defects are major contributors to test escapes and in-field reliability problems for ...
textThe rapidly evolving process technologies and device complexity that have fueled the exponentia...
In current technologies (65nm and beyond), functional failures caused by shorts, opens, and stuck-at...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
As manufacturing technology scales down to 65nm and below, fabricated chips are becoming increasingl...
To meet the market demand, next generation of technology appears with increasing speed and performan...
To meet the market demand, next generation of technology appears with increasing speed and performan...
To meet the market demand, next generation of technology appears with increasing speed and performan...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The semiconductor industry has widely accepted transition delay fault (TDF) and path delay fault (PD...
The scaling of fabrication technology not only provides us higher integration and enhanced performan...
<p>Timing-related defects are becoming increasingly important in nanometer-technology integrated cir...
Timing-related defects are becoming increasingly impor-tant in nanometer technology designs. Small d...
Timing-related defects are major contributors to test escapes and in-field reliability problems for ...
textThe rapidly evolving process technologies and device complexity that have fueled the exponentia...