A pinhole camera, an extreme ultraviolet EUV spectrometer, a fast gatable multichannel plate EUV detector, and a digital camera have been installed on the ASML EUV laboratory setup to perform time-resolvedpinhole imaging and EUV spectroscopy on a copy of the Philips EUV hollow cathode discharge plasma source.The main properties of the setup have been characterized. Time-resolved measurements within the plasma pulse in the EUV have been performed on this source. Specific features of the plasma, such as a ring shape in the initiation phase and a propagating sphere during the pinch phase, have either been discovered or confirmed experimentally. Relative populations of various ionization stages in the pinch plasma have been estimated on the bas...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
The creation of plasma by direct photo ionization by extreme ultraviolet radiation (EUV, 13.5 nm) is...
An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant condit...
A pinhole camera, an extreme ultraviolet EUV spectrometer, a fast gatable multichannel plate EUV det...
A pinhole camera, an extreme ultraviolet EUV spectrometer, a fast gatable multichannel plate EUV det...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
Pulsed discharge plasmas are considered to be important candidate sources of extreme ultraviolet (EU...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
The creation of plasma by direct photo ionization by extreme ultraviolet radiation (EUV, 13.5 nm) is...
An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant condit...
A pinhole camera, an extreme ultraviolet EUV spectrometer, a fast gatable multichannel plate EUV det...
A pinhole camera, an extreme ultraviolet EUV spectrometer, a fast gatable multichannel plate EUV det...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
A pinhole camera, an extreme ultraviolet (EUV) spectrometer, a fast gatable multichannel plate EUV d...
Pulsed discharge plasmas are considered to be important candidate sources of extreme ultraviolet (EU...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
Short-lived discharge plasmas are currently investigated as candidate sources of extreme ultraviolet...
The creation of plasma by direct photo ionization by extreme ultraviolet radiation (EUV, 13.5 nm) is...
An experimental setup that directly reproduces extreme ultraviolet (EUV) lithography relevant condit...