Verfahren zur maskenlosen Formation von Metall-Nanostrukturen in duennen dielektrischen Schichten mittels Bestrahlung mit ultrakurzen Laserimpulsen

DE 10064456 A UPAB: 20020906 NOVELTY - A maskless process for forming metallic nanostructures in thin dielectric layers comprises irradiating a multilayer dielectric containing metallic nanoparticles or thin metal layers with ultrashort laser pulses in an infinite field arrangement with a structure breadth not greater than the laser wavelength. USE - In forming metallic nanostructures in thin dielectric layers (claimed) ADVANTAGE - No complex masking processes are needed, the optics are simple, either the laser or target can be moved and complex structures can be formed