Duennschichtmaske und Verfahren zu deren Herstellung

DE 10253126 A UPAB: 20040709 NOVELTY - Thin layer mask is produced by selectively irradiating a layer (4) applied on a substrate (1) by CVD. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a process for the production of a thin layer mask. USE - Used for producing microstructures in microelectronics, nanotechnology and in microsystems technology. ADVANTAGE - Microstructures can be easily formed using the thin layer mask