DE 10323394 A UPAB: 20050117 NOVELTY - A semiconductor (100) is given a first connection face (118) and a pin (112) extending into a recess (110). A second semiconductor (102) is given a connection face (128). The semiconductors are stacked with the faces opposite each other. Pressure is exerted on the pin (112) forming a connection between the faces. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for equipment for making the connection as described, and the assembly so produced. USE - Used to connect semiconductor chip and/or wafer sections, producing stacked assemblies. ADVANTAGE - The process improves the electrical connection in stacked semiconductor assemblies. High localized pressure is exerted, improving over the poor- or non...
DE1004021259 A UPAB: 20051222 NOVELTY - Production of a semiconductor substrate (102) comprises prep...
WO 2010094511 A2 UPAB: 20100910 NOVELTY - The method for the production of component arrangement (10...
NOVELTY - A semiconductor component is produced by forming conductive vias through the component lay...
DE1004056970 A UPAB: 20060623 NOVELTY - Production of an electrical contact between a first semicond...
DE 102010005465 A1 UPAB: 20100915 NOVELTY - The component (1) has a protective layer (4) arranged on...
DE 102005039068 A1 UPAB: 20070402 NOVELTY - A semiconductor substrate comprises electrical connectio...
DE1004015017 A UPAB: 20051125 NOVELTY - Forming a mechanical and electrical connection between two s...
DE 10122424 A UPAB: 20030204 NOVELTY - Process for contacting vertical conductors in semiconductor c...
DE 102007041229 A1 UPAB: 20090401 NOVELTY - The circuit arrangement has a substrate (110) with a con...
WO 2009076930 A2 UPAB: 20090707 NOVELTY - Method for producing a soldered connection between two com...
WO 2009062757 A1 UPAB: 20090604 NOVELTY - The method for connecting two joining surfaces of a compon...
This new method bonds and connects an integrated circuit (10) to a substrate (26), directly. An anis...
DE 102006045836 A1 UPAB: 20080620 NOVELTY - The method involves boring a clearance hole (3) in a sem...
DE 102007009383 A1 UPAB: 20080912 NOVELTY - The arrangement has an integrated circuit (2) arranged o...
Electrically conducting connection between a first and a second boundary surface of a substrate (8) ...
DE1004021259 A UPAB: 20051222 NOVELTY - Production of a semiconductor substrate (102) comprises prep...
WO 2010094511 A2 UPAB: 20100910 NOVELTY - The method for the production of component arrangement (10...
NOVELTY - A semiconductor component is produced by forming conductive vias through the component lay...
DE1004056970 A UPAB: 20060623 NOVELTY - Production of an electrical contact between a first semicond...
DE 102010005465 A1 UPAB: 20100915 NOVELTY - The component (1) has a protective layer (4) arranged on...
DE 102005039068 A1 UPAB: 20070402 NOVELTY - A semiconductor substrate comprises electrical connectio...
DE1004015017 A UPAB: 20051125 NOVELTY - Forming a mechanical and electrical connection between two s...
DE 10122424 A UPAB: 20030204 NOVELTY - Process for contacting vertical conductors in semiconductor c...
DE 102007041229 A1 UPAB: 20090401 NOVELTY - The circuit arrangement has a substrate (110) with a con...
WO 2009076930 A2 UPAB: 20090707 NOVELTY - Method for producing a soldered connection between two com...
WO 2009062757 A1 UPAB: 20090604 NOVELTY - The method for connecting two joining surfaces of a compon...
This new method bonds and connects an integrated circuit (10) to a substrate (26), directly. An anis...
DE 102006045836 A1 UPAB: 20080620 NOVELTY - The method involves boring a clearance hole (3) in a sem...
DE 102007009383 A1 UPAB: 20080912 NOVELTY - The arrangement has an integrated circuit (2) arranged o...
Electrically conducting connection between a first and a second boundary surface of a substrate (8) ...
DE1004021259 A UPAB: 20051222 NOVELTY - Production of a semiconductor substrate (102) comprises prep...
WO 2010094511 A2 UPAB: 20100910 NOVELTY - The method for the production of component arrangement (10...
NOVELTY - A semiconductor component is produced by forming conductive vias through the component lay...