Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approach

Recent research revealed that using the effective medium approach to generate arbitrary multi-phase level computer-generated holograms is a promising alternative to the conventional multi-height level approach. Although this method reduces the fabrication effort using one-step binary lithography, the subwavelength patterning process remains a huge challenge, particularly for large-scale applications. To reduce the writing time on variable shaped electron beam writing systems, an optimized strategy based on an appropriate reshaping of the binary subwavelength structures is illustrated. This strategy was applied to fabricate a three-phase level CGH in the visible range, showing promising experimental results