A direct correlation was found for the first time between theory and experiments on the localized electronic states at a semiconductor-semiconductor interface. The investigation involved synchrotron-radiation photoemission experiments and tight-binding calculations on Ge adatoms on cleaved Si substrates. The theoretically predicted interface states in a region 4-9 eV below the Fermi level were detected in the experimental spectra. These occupied states and their unoccupied counterparts have a fundamental influence on the localized one-electron transitions and on relevant heterojunction parameters in transport processes
The initial stages of interface formation between various group III, IV, and V adsorbates and the Si...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...
A direct correlation was found for the first time between theory and experiments on the localized el...
A comparison between the formation mechanism of Ge-GaAs(110) and Ge-Si(111) is presented. The locali...
A comparison between the formation mechanism of Ge-GaAs(110) and Ge-Si(111) is presented. The locali...
The experimental and theoretical progress in understanding the electronic structure and the related ...
The difference in Schottky-barrier height of epitaxial Si(111) (square-root 3 X square-root 3)R 30-d...
The difference in Schottky-barrier height of epitaxial Si(111) (square-root 3 X square-root 3)R 30-d...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
The initial stages of interface formation between various group III, IV, and V adsorbates and the Si...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
The initial stages of interface formation between various group III, IV, and V adsorbates and the Si...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...
A direct correlation was found for the first time between theory and experiments on the localized el...
A comparison between the formation mechanism of Ge-GaAs(110) and Ge-Si(111) is presented. The locali...
A comparison between the formation mechanism of Ge-GaAs(110) and Ge-Si(111) is presented. The locali...
The experimental and theoretical progress in understanding the electronic structure and the related ...
The difference in Schottky-barrier height of epitaxial Si(111) (square-root 3 X square-root 3)R 30-d...
The difference in Schottky-barrier height of epitaxial Si(111) (square-root 3 X square-root 3)R 30-d...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
The initial stages of interface formation between various group III, IV, and V adsorbates and the Si...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
We present a joint experimental and theoretical study of the electronic properties of the rebonded-s...
The initial stages of interface formation between various group III, IV, and V adsorbates and the Si...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...
The clean and reacted surfaces of Si(111)-(7x7), Si(100)-(2x1), Ge(111)-c(2x8), and Ge(100)-(2x1) ha...