Defect generation in low-energy ion-assisted thermal deposited lithium fluoride films

We present first results concerning stable formation of primary electronic defects and lithium nanometer sized clusters in LiF thin films grown by ion-assisted thermal deposition. The optical and morphological properties of the as grown LiF films, dependent on the deposition conditions, such as ion-beam energy and ion species (Xe, Ar), are reported. The experimental results show a larger efficiency of low-energy Xe ions in inducing the formation of lithium nano-clusters. To analyse the role of the deposition conditions, a preliminary interpretation of the lithium nano-cluster formation mechanism based on the spherical and/or cylindrical spike thermal model is given. (C) 2003 Elsevier B.V. All rights reserved