Using an atomistic full-band quantum transport solver, we investigate the performances of vertical band-to-band tunneling FETs (TFETs) whose operation is based on the enhance- ment of the gate-induced drain leakage mechanism of MOSFETs, and we compare them to lateral p-i-n devices. Although the ver- tical TFETs offer larger tunneling areas and therefore larger ON currents than their lateral counterparts, they suffer from lateral source-to-drain tunneling leakage away from the gate contact. We propose a design improvement to reduce the OFF current of the vertical TFETs, maintain large ON currents, and provide steep subthreshold slopes
The conventional metal oxide semiconductor field effect transistor (MOSFET)may not be suitable for f...
International audienceWe simulate a band-to-band tunneling field-effect transistor based on a vertic...
Continuous downscaling of CMOS technology at the nanometer scale with conventional MOSFETs leads to ...
With the scaling of MOSFET devices down to the sub-10 nm regime, there has been an active search for...
As CMOS electronics grow ever more ubiquitous and essential to modern life, managing and reducing po...
Power consumption has been among the most important challenges for electronics industry and transist...
The source doping engineering, the low bandgap material and the vertical tunneling structure have re...
Abstract—The effect of quantum mechanical confinement in re-cently proposed thin-body double-gate el...
Scaling of metal-oxide-semiconductor field-effect transistors (MOSFET) is hitting fundamental limits...
In this paper we analyze the capabilities in terms of average subthreshold swing and on-current of S...
The Tunnel-FET (TFET) device is a gated reverse biased p-i-n junction whose working principle is bas...
As the conventional metal oxide semiconductor field-effect transistor (MOSFET) keep scaling down to ...
As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accord...
Tunnel Field-Effect Transistors (TFETs) are an emerging alternative to CMOS for ultralow power and n...
Tunnel field-effect transistors are promising successors of metal-oxide-semiconductor field-effect t...
The conventional metal oxide semiconductor field effect transistor (MOSFET)may not be suitable for f...
International audienceWe simulate a band-to-band tunneling field-effect transistor based on a vertic...
Continuous downscaling of CMOS technology at the nanometer scale with conventional MOSFETs leads to ...
With the scaling of MOSFET devices down to the sub-10 nm regime, there has been an active search for...
As CMOS electronics grow ever more ubiquitous and essential to modern life, managing and reducing po...
Power consumption has been among the most important challenges for electronics industry and transist...
The source doping engineering, the low bandgap material and the vertical tunneling structure have re...
Abstract—The effect of quantum mechanical confinement in re-cently proposed thin-body double-gate el...
Scaling of metal-oxide-semiconductor field-effect transistors (MOSFET) is hitting fundamental limits...
In this paper we analyze the capabilities in terms of average subthreshold swing and on-current of S...
The Tunnel-FET (TFET) device is a gated reverse biased p-i-n junction whose working principle is bas...
As the conventional metal oxide semiconductor field-effect transistor (MOSFET) keep scaling down to ...
As the physical dimensions of the MOSFET have been scaling, the supply voltage has not scaled accord...
Tunnel Field-Effect Transistors (TFETs) are an emerging alternative to CMOS for ultralow power and n...
Tunnel field-effect transistors are promising successors of metal-oxide-semiconductor field-effect t...
The conventional metal oxide semiconductor field effect transistor (MOSFET)may not be suitable for f...
International audienceWe simulate a band-to-band tunneling field-effect transistor based on a vertic...
Continuous downscaling of CMOS technology at the nanometer scale with conventional MOSFETs leads to ...