One of the topical areas of solid state photoelectronics is the creation of infrared detectors based on unipolar barrier systems (for example, with an nBn architecture). The greatest progress has been achieved in the development of barrier detectors based on semiconductors of the AIIIBV group, which is associated with the possibility of realizing systems with a zero barrier in the valence band. Unipolar barrier detectors based on mercury cadmium telluride (HgCdTe) grown by molecular beam epitaxy (MBE) are of interest due to significant technological advantages, since the creation of such devices can abandon the defect forming procedure of ion implantation. Despite a significant number of theoretical works, only a few attempts are known to p...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Metal-insulator-semiconductor (MIS) structures were fabricated by depositing an Al2O3 dielectric o
Delta-doped layers together with compositionally grading have been utilized to get nBn configuration...
Mid-wave infrared nBn structures based on HgCdTe grown by molecular beam epitaxy on GaAs (013) subst...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
Implementation of the unipolar barrier detector concept in HgCdTe-based compound semiconductor alloy...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
The II-VI semiconductor HgCdTe (MCT) is the most successful infrared photodetector material to date....
The II-VI semiconductor HgCdTe (MCT) is the most successful infrared photodetector material to date....
The results of studying the admittance of unipolar barrier structures based on HgCdTe grown by molec...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
Infrared detectors have wide application in a range of industry sectors, including defence, astronom...
The admittance of nBn structures based on HgCdTe grown by molecular beam epitaxy (MBE) on GaAs (013)...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Metal-insulator-semiconductor (MIS) structures were fabricated by depositing an Al2O3 dielectric o
Delta-doped layers together with compositionally grading have been utilized to get nBn configuration...
Mid-wave infrared nBn structures based on HgCdTe grown by molecular beam epitaxy on GaAs (013) subst...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
Implementation of the unipolar barrier detector concept in HgCdTe-based compound semiconductor alloy...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
The II-VI semiconductor HgCdTe (MCT) is the most successful infrared photodetector material to date....
The II-VI semiconductor HgCdTe (MCT) is the most successful infrared photodetector material to date....
The results of studying the admittance of unipolar barrier structures based on HgCdTe grown by molec...
This work is devoted to a comprehensive experimental study of the electrical and photoelectric chara...
Infrared detectors have wide application in a range of industry sectors, including defence, astronom...
The admittance of nBn structures based on HgCdTe grown by molecular beam epitaxy (MBE) on GaAs (013)...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Modern trends in the technology of CdxHg1–xTe-based photosensitive barrier structures for the middle...
Metal-insulator-semiconductor (MIS) structures were fabricated by depositing an Al2O3 dielectric o