The formation of silica fume when liquid metal is in contact with air during refining of metallurgical grade silicon leads to a direct loss of silicon. Apart from this yield loss the associated fume may be harmful to the workers in the plant. During tapping, refining and casting of silicon, the fume formation makes up 40 – 80 % of the fugitive emissions from the plant. In this work, the kinetics and mechanisms of fume formation during refining of metallurgical grade silicon were studied. Active oxidation is defined as the partial oxidation of Si to the gaseous product SiO. This type of oxidation does not protect the surface from further attack (passivation).When reviewing relevant literature, the majority of the research on active oxidation...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
Oxidation is the most commonly used method of passivating porous silicon (PSi) surfaces against unwa...
The aim of this work was to study the effect of flow rate on the fuming rate/silica flux of liquid s...
The oxidation of silicon (Si) has been extensively investigated over the past 50 years. Yet, an unde...
Silicon is used in the production of various ceramic products. As the solar industry is advancing, t...
Since the 1960's many adaptations to the linear parabolic model for silicon oxidation have been prop...
Since the 1960's many adaptations to the linear parabolic model for silicon oxidation have been prop...
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
English summary Metallurgical grade silicon (MG-Si) is used as an alloying agent, raw material, o...
The mechanisms in the carbothermic production of silicon have been examined in this report. Through ...
Nonplanar silicon surfaces were prepared and oxidized at 900~176 and the oxide morphology was studie...
Wet Thermal Oxidation of Silicon in VLSI is an extremely important step in the formation of field ox...
Insights into the transport and deposition of oxygen in silicon oxidation at 700 ~ have been obtaine...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
Oxidation is the most commonly used method of passivating porous silicon (PSi) surfaces against unwa...
The aim of this work was to study the effect of flow rate on the fuming rate/silica flux of liquid s...
The oxidation of silicon (Si) has been extensively investigated over the past 50 years. Yet, an unde...
Silicon is used in the production of various ceramic products. As the solar industry is advancing, t...
Since the 1960's many adaptations to the linear parabolic model for silicon oxidation have been prop...
Since the 1960's many adaptations to the linear parabolic model for silicon oxidation have been prop...
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
Silicon dioxide is the most commonly used insulator material in IC technology and in the other field...
English summary Metallurgical grade silicon (MG-Si) is used as an alloying agent, raw material, o...
The mechanisms in the carbothermic production of silicon have been examined in this report. Through ...
Nonplanar silicon surfaces were prepared and oxidized at 900~176 and the oxide morphology was studie...
Wet Thermal Oxidation of Silicon in VLSI is an extremely important step in the formation of field ox...
Insights into the transport and deposition of oxygen in silicon oxidation at 700 ~ have been obtaine...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
The nucleation-initiated oxidation of a Si surface at very low temperatures in plasmas is demonstrat...
Oxidation is the most commonly used method of passivating porous silicon (PSi) surfaces against unwa...