This study highlights the role of nitrogen vacancies and defect structures in engineering hard coatings with enhanced phase stability and mechanical properties for high temperature applications. Titanium aluminum nitride (Ti,Al)N based materials in the form of thin coatings has remained as an outstanding choice for protection of metal cutting tools due to its superior oxidation resistance and high-temperature wear resistance. High-temperature spinodal decomposition of metastable (Ti,Al)N into coherent c-TiN and c-AlN nm-sized domains results in high hardness at elevated temperatures. Even higher thermal input leads to transformation of c-AlN to w-AlN, which is detrimental to the mechanical properties of the coating. One mean to delay this t...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
[[abstract]]Transition metal nitrides and carbides, especially TiN, are widely applied as hard coati...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
Cette étude met en évidence le rôle des lacunes d’azote et des défauts structuraux dans l’ingénierie...
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and mult...
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and mult...
Aspects on the phase stability and mechanical properties of nitrogen deficient (Ti0.54Al0.46)N-y all...
Aspects on the phase stability and mechanical properties of nitrogen deficient (Ti0.54Al0.46)N-y all...
Temperature-dependent nanoindentation testing was employed to investigate the deformation behaviour ...
Supersaturated (Ti,Al)N materials with face centered cubic (fcc) structure offer unique combinations...
The effect of varying nitrogen vacancies on the growth, microstructure, spinodal decomposition and h...
Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, us...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
[[abstract]]Transition metal nitrides and carbides, especially TiN, are widely applied as hard coati...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
This study highlights the role of nitrogen vacancies and defect structures in engineering hard coati...
Cette étude met en évidence le rôle des lacunes d’azote et des défauts structuraux dans l’ingénierie...
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and mult...
This thesis investigates the effect of point defects (nitrogen vacancies and interstitials) and mult...
Aspects on the phase stability and mechanical properties of nitrogen deficient (Ti0.54Al0.46)N-y all...
Aspects on the phase stability and mechanical properties of nitrogen deficient (Ti0.54Al0.46)N-y all...
Temperature-dependent nanoindentation testing was employed to investigate the deformation behaviour ...
Supersaturated (Ti,Al)N materials with face centered cubic (fcc) structure offer unique combinations...
The effect of varying nitrogen vacancies on the growth, microstructure, spinodal decomposition and h...
Ti–Si–Al–N films were prepared by rf reactive magnetron sputtering, in static and rotation modes, us...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
[[abstract]]Transition metal nitrides and carbides, especially TiN, are widely applied as hard coati...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...