The continuing improved performance of the digital electronic devices requires new memory technologies which should be inexpensively fabricated for higher integration capacity, faster operation, and low power consumption. Resistive random access memory has great potential to become the front runner as the non volatile memory technology. The resistance states stored in such cell can remain for long time and can be read out none-destructively by a very small electrical pulse. In this work the typically two terminal memory cells containing a thin TiO2 layer are studied
Metal–insulator–metal (MIM) devices based on titanium dioxide thin films exhibit resistive switching...
Crossbar-type bipolar resistive memory devices based on low-temperature amorphous TiO2 (a-TiO2) thin...
Titanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer depositio...
The continuing improved performance of the digital electronic devices requires new memory technologi...
The continuing improved performance of the digital electronic devices requires new memory technologi...
The continuing improved performance of the digital electronic devices requires new memory technologi...
In the last decades the commercialization of computer and multimedia applications for consumer elect...
In the last decades the commercialization of computer and multimedia applications for consumer elect...
The resistive switching mechanism of 20- to 57-nm-thick TiO2 thin films grown by atomic-layer deposi...
ABSTRACT: TiO2 is being widely explored as an active resistive switching (RS) material for resistive...
Memory concepts based on resistive switching (RRAM) make use of simple metal-isolatormetal (MIM) str...
The synthesis, structure, and electrical performances of titanium dioxide (TiO2 and also doped TiO2)...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Metal–insulator–metal (MIM) devices based on titanium dioxide thin films exhibit resistive switching...
Crossbar-type bipolar resistive memory devices based on low-temperature amorphous TiO2 (a-TiO2) thin...
Titanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer depositio...
The continuing improved performance of the digital electronic devices requires new memory technologi...
The continuing improved performance of the digital electronic devices requires new memory technologi...
The continuing improved performance of the digital electronic devices requires new memory technologi...
In the last decades the commercialization of computer and multimedia applications for consumer elect...
In the last decades the commercialization of computer and multimedia applications for consumer elect...
The resistive switching mechanism of 20- to 57-nm-thick TiO2 thin films grown by atomic-layer deposi...
ABSTRACT: TiO2 is being widely explored as an active resistive switching (RS) material for resistive...
Memory concepts based on resistive switching (RRAM) make use of simple metal-isolatormetal (MIM) str...
The synthesis, structure, and electrical performances of titanium dioxide (TiO2 and also doped TiO2)...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Titanium dioxide thin films have attracted increasing attention due to their potential in next-gener...
Metal–insulator–metal (MIM) devices based on titanium dioxide thin films exhibit resistive switching...
Crossbar-type bipolar resistive memory devices based on low-temperature amorphous TiO2 (a-TiO2) thin...
Titanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer depositio...