Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate position measurement systems, which is currently led by the advent of Extreme UltraViolet (EUV)-lithography machines. This PhD-research describes an interferometric displacement measurement system that possess the potential to foresee in the need for measurement accuracy in lithography systems far into this century. Besides the demanding measurement accuracies in these machines, also the size extension of the silicon substrates from 300 mm to 450 mm presents a challenge. The progress of these aspects promotes the improvement or development of new measurement tools for lithographic exposure equipment. The aim of this research was to design a “com...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
This paper describes a novel heterodyne laser interferometer with no significant periodic nonlineari...
[[abstract]]A laser interferometer system based on three design principles, the heterodyne frequency...
Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate pos...
The integrated circuit industry builds integrated circuits (IC’s) by placing many layers of semi con...
Many error sources can affect the accuracy of displacement measuring interferometer systems. In hete...
Many error sources can affect the accuracy of displacement measuring interferometer systems. In hete...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
The Laser Interferometer Gravitational-Wave Observatory (LIGO) and the Laser Interferometer Space An...
This master's thesis is focused on optical methods of measurement of very small dynamic displacement...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
We present the design, implementation, and characterization of a heterodyne laser interferometer fo...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
The paper describes an interferometric technique suitable for the absolute measurement of displaceme...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
This paper describes a novel heterodyne laser interferometer with no significant periodic nonlineari...
[[abstract]]A laser interferometer system based on three design principles, the heterodyne frequency...
Lithographic exposure equipment for integrated circuit manufacturing requires ever more accurate pos...
The integrated circuit industry builds integrated circuits (IC’s) by placing many layers of semi con...
Many error sources can affect the accuracy of displacement measuring interferometer systems. In hete...
Many error sources can affect the accuracy of displacement measuring interferometer systems. In hete...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
For the past thirty years, microchips have doubled in complexity every two years. This increasing co...
The Laser Interferometer Gravitational-Wave Observatory (LIGO) and the Laser Interferometer Space An...
This master's thesis is focused on optical methods of measurement of very small dynamic displacement...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
We present the design, implementation, and characterization of a heterodyne laser interferometer fo...
In order to achieve nanometer accuracy, metrologists need to identify the sources of error...
The paper describes an interferometric technique suitable for the absolute measurement of displaceme...
Development in industry is asking for improved resolution and higher accuracy in mechanical measurem...
This paper describes a novel heterodyne laser interferometer with no significant periodic nonlineari...
[[abstract]]A laser interferometer system based on three design principles, the heterodyne frequency...