Thin films of Ni-rich Ti-Ni and Ti-rich Ti-Ni were prepared by sputtering. The films were annealed at 773 and 973K for various times from 3.6 to 360ks in order to crystallize them. After the heat treatments, the shape memory characteristics of the films were investigated by measuring the strain during cooling and heating under various constant stresses between 40 and 520MPa. The shape memory behavior of the films was found to be very sensitive to the annealing conditions. The Ni-rich films annealed at 773K showed a two-stage shape change, while the ones annealed at 973K showed a single-stage shape change. The martensitic and reverse martensitic transformation temperatures increased with decreasing annealing temperature and increasing anneal...
The influence of annealing parameters on the martensitic phase transformation in sputter-deposited T...
High temperature shape memory thin films of Ti-Pd-Ni were formed with a carousel type magnetron sput...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
Thin films of Ni-rich Ti-Ni and Ti-rich Ti-Ni were prepared by sputtering. The films were annealed a...
The shape memory behavior of Ti-rich Ti-Ni thin films (Ti-45.2, 47.0, 47.9 at. %Ni) annealed at 773,...
Ti-Ni shape memory alloy thin films were deposited using RF magnetron sputtering. The lattice consta...
Ti-Ni shape memory alloy thin films were deposited using RF magnetron sputtering. The lattice consta...
Films deposited on quartz substrates by sputtering in an argon atmosphere using a sputtering target ...
Morphology and martensitic transformation temperatures of sputter-deposited Ti 51.5 Ni 48.5 thin fil...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
The influence of annealing parameters on the martensitic phase transformation in sputter-deposited T...
High temperature shape memory thin films of Ti-Pd-Ni were formed with a carousel type magnetron sput...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...
Thin films of Ni-rich Ti-Ni and Ti-rich Ti-Ni were prepared by sputtering. The films were annealed a...
The shape memory behavior of Ti-rich Ti-Ni thin films (Ti-45.2, 47.0, 47.9 at. %Ni) annealed at 773,...
Ti-Ni shape memory alloy thin films were deposited using RF magnetron sputtering. The lattice consta...
Ti-Ni shape memory alloy thin films were deposited using RF magnetron sputtering. The lattice consta...
Films deposited on quartz substrates by sputtering in an argon atmosphere using a sputtering target ...
Morphology and martensitic transformation temperatures of sputter-deposited Ti 51.5 Ni 48.5 thin fil...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
In the present work, the properties of two NiTi-based shape memory alloy thin films, namely Ti50Ni25...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
Since 1992 the present authors have been successful in making Ti-Ni shape memory alloy thin films, w...
The influence of annealing parameters on the martensitic phase transformation in sputter-deposited T...
High temperature shape memory thin films of Ti-Pd-Ni were formed with a carousel type magnetron sput...
The effect of deposition temperature on residual stress evolution with temperature in Ti-rich NiTi f...