In this paper, experiments performed on Au-Si (100) junctions by Ballistic Electron Emission Microscopy (BEEM), a method for studying the metal -semiconductor interface, are presented. BEEM spectra show a characteristic threshold that yields the Schottky barrier height at the interface. The average barrier height is found to be lower than the usual values of Au-Si contacts. BEEM images result from the spatial variations of the current in the semiconductor and present unusual local contrasts. These phenomena are analysed in terms of interface quality
Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor d...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...
In this paper, experiments performed on Au-Si (100) junctions by Ballistic Electron Emission Microsc...
In this paper, experiments performed on Au-Si (100) junctions by Ballistic Electron Emission Microsc...
Through the results obtained on Au-Si(100) junctions, we show the main aspects of Ballistic Electron...
The invention of ballistic-electron-emission microscopy (BEEM) has made it possible to study hot ele...
The Au/n-Si(100) contact has been studied using reverse ballistic electron emission microscopy and s...
Due to the character of the original source materials and the nature of batch digitization, quality ...
cited By 1International audienceThe Au/n-Si(100) contact has been studied using reverse ballistic el...
Ballistic Electron Emission Microscopy allows buried interfaces to be characterized with a subnanome...
Ballistic Electron Emission Microscopy allows buried interfaces to be characterized with a subnanome...
PtSi–n‐Si(100) Schottky contacts have been studied by ballistic electron emission microscopy (BEEM) ...
cited By 1International audienceThe Au/n-Si(100) contact has been studied using reverse ballistic el...
Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor d...
Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor d...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...
In this paper, experiments performed on Au-Si (100) junctions by Ballistic Electron Emission Microsc...
In this paper, experiments performed on Au-Si (100) junctions by Ballistic Electron Emission Microsc...
Through the results obtained on Au-Si(100) junctions, we show the main aspects of Ballistic Electron...
The invention of ballistic-electron-emission microscopy (BEEM) has made it possible to study hot ele...
The Au/n-Si(100) contact has been studied using reverse ballistic electron emission microscopy and s...
Due to the character of the original source materials and the nature of batch digitization, quality ...
cited By 1International audienceThe Au/n-Si(100) contact has been studied using reverse ballistic el...
Ballistic Electron Emission Microscopy allows buried interfaces to be characterized with a subnanome...
Ballistic Electron Emission Microscopy allows buried interfaces to be characterized with a subnanome...
PtSi–n‐Si(100) Schottky contacts have been studied by ballistic electron emission microscopy (BEEM) ...
cited By 1International audienceThe Au/n-Si(100) contact has been studied using reverse ballistic el...
Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor d...
Ballistic electron emission microscopy (BEEM) was employed to study metal/dielectric/semiconductor d...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...
The Schottky barrier height at the Au/porous silicon interface has been studied with ballistic elect...