The novel probabilistic models of the random variations in nanoscale MOSFET's high frequency performance defined in terms of gate capacitance and transition frequency have been proposed. As the transition frequency variation has also been considered, the proposed models are considered as complete unlike the previous one which take only the gate capacitance variation into account. The proposed models have been found to be both analytic and physical level oriented as they are the precise mathematical expressions in terms of physical parameters. Since the up-to-date model of variation in MOSFET's characteristic induced by physical level fluctuation has been used, part of the proposed models for gate capacitance is more accurate and physical le...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
This paper investigates the impact of random dopant fluctuation effect on surrounding gate MOSFET, f...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
© 1993-2012 IEEE. Advanced scaling and the introduction of new materials in the metal-oxide-semicond...
In this research, the analysis of statistical variations in subthreshold MOSFET's high frequency cha...
Intrinsic parameter fluctuations have become a very important problem for the scaling and integratio...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
Subthreshold MOSFET has been adopted in many low power VHF circuits/systems in which their performan...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
This paper investigates the impact of random dopant fluctuation effect on surrounding gate MOSFET, f...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
The modified alpha power law based model of statistical fluctuation in drain current of an unconvent...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
This paper investigates the impact of random dopant fluctuation effect on surrounding gate MOSFET, f...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
© 1993-2012 IEEE. Advanced scaling and the introduction of new materials in the metal-oxide-semicond...
In this research, the analysis of statistical variations in subthreshold MOSFET's high frequency cha...
Intrinsic parameter fluctuations have become a very important problem for the scaling and integratio...
Abstract—In nanoscale CMOS circuits the random dopant fluc-tuations (RDF) cause significant threshol...
Subthreshold MOSFET has been adopted in many low power VHF circuits/systems in which their performan...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
This paper investigates the impact of random dopant fluctuation effect on surrounding gate MOSFET, f...
A comprehensive simulation methodology for the systematic study of gate leakage variability in reali...
The modified alpha power law based model of statistical fluctuation in drain current of an unconvent...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...
This paper investigates the impact of random dopant fluctuation effect on surrounding gate MOSFET, f...
The intrinsic variability of nanoscale VLSI technology must be taken into account when analyzing cir...