The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.Board of Regents, University of Texas Syste
A system of determining and correcting alignment during imprint lithography process is described. Du...
En microélectronique, l'augmentation de la densité des composants est la solution principale pour am...
A method, system and unit for determining alignment in a layered device such as a semiconductor devi...
The present invention provides a method for determining the forces to be applied to a substrate in o...
Microlithography is the process of transfer of minute electronic circuit patterns from a template (a...
Microlithography is the process of transfer of minute electronic circuit patterns from a template (a...
A system of determining and correcting alignment during imprint lithography process is described. Du...
A method of determining and correcting alignment during imprint lithography process is described. Du...
A method of determining and correcting alignment during imprint lithography process is described. Du...
Processes and associated devices for high precision positioning of a template an substrate during im...
Processes and associated devices for high precision positioning of a template an substrate during im...
The invention relates to a system for aligning two or more patterns on a substrate using vacuum sten...
The metrology in submicron lilthography is an increasingly difficult task. Especially the control of...
Among the various contenders for VLSI lithography below 0.1 $\mu$m, proximity x-ray printing is the ...
A system of determining and correcting alignment during imprint lithography process is described. Du...
A system of determining and correcting alignment during imprint lithography process is described. Du...
En microélectronique, l'augmentation de la densité des composants est la solution principale pour am...
A method, system and unit for determining alignment in a layered device such as a semiconductor devi...
The present invention provides a method for determining the forces to be applied to a substrate in o...
Microlithography is the process of transfer of minute electronic circuit patterns from a template (a...
Microlithography is the process of transfer of minute electronic circuit patterns from a template (a...
A system of determining and correcting alignment during imprint lithography process is described. Du...
A method of determining and correcting alignment during imprint lithography process is described. Du...
A method of determining and correcting alignment during imprint lithography process is described. Du...
Processes and associated devices for high precision positioning of a template an substrate during im...
Processes and associated devices for high precision positioning of a template an substrate during im...
The invention relates to a system for aligning two or more patterns on a substrate using vacuum sten...
The metrology in submicron lilthography is an increasingly difficult task. Especially the control of...
Among the various contenders for VLSI lithography below 0.1 $\mu$m, proximity x-ray printing is the ...
A system of determining and correcting alignment during imprint lithography process is described. Du...
A system of determining and correcting alignment during imprint lithography process is described. Du...
En microélectronique, l'augmentation de la densité des composants est la solution principale pour am...
A method, system and unit for determining alignment in a layered device such as a semiconductor devi...
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