Structural and elastic properties of InN nanowires (NWs) have been investigated. It was observed that the NWs bend spontaneously or upon meeting an obstacle in their growth path at angles that are multiples of 30°. Lithographically patterned trenches and barriers were found to influence the growth direction of the NWs, which depending on the angle of incidence, grew along the barrier or got deflected from it. Young\u27s modulus of InN NWs, measured by three point bending method using a NW suspended across a trench, was found to be 266 GPa, which is in between the moduli of bulk and thin film InN. Overall, the InN NW properties were found to be very suitable for applications in nanoelectromechanical systems (NEMS) and sensors
High quality, well-separated, homogeneous sizes and high aspect ratio Si-doped InN nanowires (NWs) w...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
An overview on InN nanowires, fabricated using either a catalyst-free molecular beam epitaxy method ...
Structural and elastic properties of InN nanowires (NWs) have been investigated. It was observed tha...
Growth of InN nanowires have been carried out on quartz substrates at different temperatures by vapo...
The hardness of wurtzite indium nitride (alpha-InN) films of 0.5 to 4 mu m in thickness was measured...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Nanodevices using individual indium nitride nanowires are fabricated by e-beam lithography. The nano...
The elastic properties of metallic and semiconducting nanowires were analyzed by different technique...
Nanomechanical properties of indium nanowires like structures fabricated on quartz substrate by tren...
Nanomechanical properties of indium nanowires like structures fabricated on quartz substrate by tren...
The hardness of wurtzite indium nitride (α-InN) films of 0.5 to 4 μm in thickness was measured by th...
The influence of the growth parameters on the photoluminescence (PL) spectra has been investigated f...
High quality, well-separated, homogeneous sizes and high aspect ratio Si-doped InN nanowires (NWs) w...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
An overview on InN nanowires, fabricated using either a catalyst-free molecular beam epitaxy method ...
Structural and elastic properties of InN nanowires (NWs) have been investigated. It was observed tha...
Growth of InN nanowires have been carried out on quartz substrates at different temperatures by vapo...
The hardness of wurtzite indium nitride (alpha-InN) films of 0.5 to 4 mu m in thickness was measured...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Diameter-dependent electrical properties of InN nanowires (NWs) grown by chemical vapor deposition h...
Nanodevices using individual indium nitride nanowires are fabricated by e-beam lithography. The nano...
The elastic properties of metallic and semiconducting nanowires were analyzed by different technique...
Nanomechanical properties of indium nanowires like structures fabricated on quartz substrate by tren...
Nanomechanical properties of indium nanowires like structures fabricated on quartz substrate by tren...
The hardness of wurtzite indium nitride (α-InN) films of 0.5 to 4 μm in thickness was measured by th...
The influence of the growth parameters on the photoluminescence (PL) spectra has been investigated f...
High quality, well-separated, homogeneous sizes and high aspect ratio Si-doped InN nanowires (NWs) w...
[[sponsorship]]原子與分子科學研究所[[note]]已出版;[SCI];有審查制度;具代表性[[note]]http://gateway.isiknowledge.com/gateway...
An overview on InN nanowires, fabricated using either a catalyst-free molecular beam epitaxy method ...