Removing or detaching particles from a surface is of interest in filter bed regeneration, cleaning of semiconductor surfaces, migration of fines in underground reservoirs, and detergency. A two-stage removal process proposed involves penetration of the surfactant solution, diffusion and adsorption of surfactant molecules, followed by the particle removal by hydrodynamic force. The particle-substrate system, considered here as a plate-plate system, takes into account the surface roughness of the substrate in the form of asperities. The concept of critical hydrodynamic force required to remove or detach a particle adhering to a substrate in the presence of surfactant solution is discussed, as well as its calculation of typical values. The cri...
Fibrous filters have long been recognized as an efficient means of removing aerosol particles from t...
Cohesion forces in contacts of discrete spherical particles (having either hydrophilic or hydrophobi...
A 2 orders of magnitude range of van der Waals interactions is considered here to take the majority ...
In this paper, the reentrainment of nanosized and microsized particles from rough walls under variou...
This chapter presented a range of techniques that have a great potential for providing novel and use...
A cleaning technique widely used by the nuclear utility industry for removal of radioactive surface ...
The removal of nano- or submicron particles from solid substrates is of considerable interest in a r...
AbstractThis paper describes possibilities to separate particles with difficult dust properties from...
A physical model is presented to describe the kinds of static forces responsible for adhesion of nan...
By allowing an air-bubble to pass through a parallel plate flow chamber with negatively charged, col...
Micron-sized particles adhering to collector surfaces can be detached by passing a liquid-air interf...
Material removal in chemical mechanical polishing (CMP) occurs by a pressure accentuated chemical at...
Forces between solids in air are predominantly attractive and cause adhesion of particles to each ot...
In many industrial processes, particle contamination is becoming a major issue. Particle detachment ...
This work extended the current fundamental models for particles adhering to thin films. Particle rem...
Fibrous filters have long been recognized as an efficient means of removing aerosol particles from t...
Cohesion forces in contacts of discrete spherical particles (having either hydrophilic or hydrophobi...
A 2 orders of magnitude range of van der Waals interactions is considered here to take the majority ...
In this paper, the reentrainment of nanosized and microsized particles from rough walls under variou...
This chapter presented a range of techniques that have a great potential for providing novel and use...
A cleaning technique widely used by the nuclear utility industry for removal of radioactive surface ...
The removal of nano- or submicron particles from solid substrates is of considerable interest in a r...
AbstractThis paper describes possibilities to separate particles with difficult dust properties from...
A physical model is presented to describe the kinds of static forces responsible for adhesion of nan...
By allowing an air-bubble to pass through a parallel plate flow chamber with negatively charged, col...
Micron-sized particles adhering to collector surfaces can be detached by passing a liquid-air interf...
Material removal in chemical mechanical polishing (CMP) occurs by a pressure accentuated chemical at...
Forces between solids in air are predominantly attractive and cause adhesion of particles to each ot...
In many industrial processes, particle contamination is becoming a major issue. Particle detachment ...
This work extended the current fundamental models for particles adhering to thin films. Particle rem...
Fibrous filters have long been recognized as an efficient means of removing aerosol particles from t...
Cohesion forces in contacts of discrete spherical particles (having either hydrophilic or hydrophobi...
A 2 orders of magnitude range of van der Waals interactions is considered here to take the majority ...