Etude théorique des hétérojonctions planaires de dichalcogénures de métaux de transition et de leurs applications pour des transistors à basse consommation

Nowadays, microprocessors can contain tens of billions of transistors and as a result, heat dissipation and its impact on device performance has increasingly become a hindrance to further scaling. Due to their working mechanism, the power supply of MOSFETs cannot be reduced without deteriorating overall performance, and Si-MOSFETs scaling therefore seems to be reaching its end. New architectures such as the TFET, which can perform at low supply voltages thanks to its reliance on band-to-band tunneling, and new materials could solve this issue. Transition metal dichalcogenide monolayers (TMDs) are 2D semiconductors with direct band gaps ranging from 1 to 2 eV, and therefore hold potential in electronics and photonics. Moreover, when under appropriate strains, their band alignment can result in broken-gap configurations which can circumvent the traditionally low currents observed in TFETs due to the tunneling mechanism they rely upon. In this work, in-plane TMD heterojunctions are investigated using an atomistic tight-binding approach, two of which lead to a broken-gap configuration (MoTe2/MoS2 and WTe2/MoS2). The potential of these heterojunctions for use in tunnel field-effect transistors (TFETs) is evaluated via quantum transport computations based on an atomistic tight-binding model and the non-equilibrium Green’s function theory. Both p-type and n-type TFETs based on these in-plane TMD heterojunctions are shownto yield high ON currents (ION > 103 µA/µm) and extremely low subthreshold swings (SS 103 µA/µm) ainsi que des pentes sous-seuil extrêmement raides (SS < 5 mV/dec) à des tensions d’alimentation très faibles (VDD = 0.3 V). Plusieurs architectures novatrices basées sur ces TFETs et découlant de la nature 2D des matériaux utilisés sont également présentées, et permettent d’atteindre des performances encore plus élevées