Direct-write atom lithography is a technique in which highly periodic nanostructures are directly deposited on a substrate by patterning an atomic beam with a standing light wave, tuned near a resonance frequency of the corresponding atom. In this thesis an extension of this technique for the production of ferromagnetic nano- structures is investigated. Of all ferromagnetic elements Fe is the most suitable to per- form atom lithography. Light with a wavelength of 372 nm is needed to produce Fe nanostructures by atom lithography. Also, the atomic beam should be highly collimated, for which laser cooling is commonly used. For this purpose, a frequency doubled Ti:S laser tuned to 744 nm is constructed, capable of producing more than 100 mW of ...