Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patterned flux is then deposited onto a substrate, resulting in a nanostructured thin film. The smallest structures that have been made thus far using this technique are around 30 nm wide. This thesis investigates the technique, expanding its possibilities. The work-horse for the development of atom lithography has been Cr, as this transition metal atom has a closed transition in a wavelength range that is accessible to dye lasers. We extend the technique to Fe, the first ferromagnetic element to be used for atom lithography. The setup that was used to do this experiment is described, along with its critical design parameters. We present nanostruc...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
Abstract We present a new method for nanoscale atom lithography. We propose the use of a supersonic ...
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
Direct write atom lithography is a technique in which nearly resonant light is used to pattern an at...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
Direct-write atom lithography is a technique in which highly periodic nanostructures are directly de...
We aim to apply atom optical techniques to iron to produce periodic magnetic nanostructures. Laser c...
Lithography based on laser focusing of a beam of neutral iron atoms shows great promise for creating...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
Iron structures with dimensions comparable to the minimum domain size of 5nm may provide us with a n...
Atom lithography [1] has attracted a great interest in the scientific community as a technique for t...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
Abstract We present a new method for nanoscale atom lithography. We propose the use of a supersonic ...
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...
Atom lithography is a technique to structure layers of atoms during deposition, using interactions o...
Direct write atom lithography is a technique in which nearly resonant light is used to pattern an at...
Atom lithography is a technique in which a light field is used to pattern an atomic beam. This patte...
Direct-write atom lithography is a technique in which highly periodic nanostructures are directly de...
We aim to apply atom optical techniques to iron to produce periodic magnetic nanostructures. Laser c...
Lithography based on laser focusing of a beam of neutral iron atoms shows great promise for creating...
Lithography is a key technology enabling progress both in fundamental research and in widespread app...
Using direct-write atom lithography, Fe nanolines are deposited with a pitch of 186 nm, a full width...
State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Alum...
Iron structures with dimensions comparable to the minimum domain size of 5nm may provide us with a n...
Atom lithography [1] has attracted a great interest in the scientific community as a technique for t...
The general features of atom lithography, such as parallel deposition, large exposure area, nanomete...
Abstract We present a new method for nanoscale atom lithography. We propose the use of a supersonic ...
Contains fulltext : 18994_lasemaofa.pdf (publisher's version ) (Open Access)Fundam...