Traditional metal-oxide-semiconductor field effect transistor scaling has advanced successfully over 50 years providing significant increases in transistor count per chip and operating frequency, thus enabled the built of ever more performant and complex systems. Approaching to atomic scales, the energy efficiency of the transistors is severely compromised due to short channel effects and the explosion in the leakage current. Although the introduction of new materials and structures postpone the confrontation with theoretical limitations, 2D scaling strategy is fast approaching its limits. Thus alternative strategies have to be engineered for future growth of chip functionalities. Accepting the nanometer-limitation and with exchange of nano...