Dust particle contamination is known to be responsible for reduced quality and yield in microelectronic processing. However it may also limit the operation of particle accelerators as a result of beam lifetime reduction or enhanced field emission in radio-frequency accelerating cavities. Intrinsic dust contamination from sources such as valves or ion pumps has not yet been studied due to the inability of commercial particle counters to be able to detect across large cross sections under ultrahigh vacuum (UHV) conditions. This motivated the development of the dust particle detector described here which is able to quantify, in situ, the level of contamination on a representative part of a vacuum vessel. This system operates under UHV conditio...
For particle free vacuum systems, as e.g. systems containing superconducting cavities to be operated...
The accurate determination of dust levels on optical surfaces is necessary to assess sensor system p...
A simple, versatile device for dispersing micrometer‐ and submicrometer-sized particles in vacuum is...
Particle emissions f rom clean room gas-handling components were measured by following a test method...
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the dev...
The Particle Cleanliness Validation System (PCVS) is a combination of a surface particle collection ...
The INEEL has analyzed a variety of dust samples from experimental tokamaks: General Atomics` DII-D,...
Plasma processing is used for {approximately}35% of the process steps required for semiconductor man...
Exposure to fine particulate matter smaller than 2.5 μm in diameter (PM 2.5) is linked to increased ...
Dust particle contamination in plasma etching reactors continues to be a major concern to microelect...
There are important safety issues associated with tokamak dust, accumulated primarily from sputterin...
Dust re-suspension and mobilization is one of the more challenging safety issues in industries and f...
Humans and their activities are known to generate considerable amounts of particulate matter indoors...
Abstract: Nanosilica is one of the most widely used nanomaterials across the world. However, their a...
Vacuuming is often promoted as a means of reducing indoor concentrations of settled particles and du...
For particle free vacuum systems, as e.g. systems containing superconducting cavities to be operated...
The accurate determination of dust levels on optical surfaces is necessary to assess sensor system p...
A simple, versatile device for dispersing micrometer‐ and submicrometer-sized particles in vacuum is...
Particle emissions f rom clean room gas-handling components were measured by following a test method...
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the dev...
The Particle Cleanliness Validation System (PCVS) is a combination of a surface particle collection ...
The INEEL has analyzed a variety of dust samples from experimental tokamaks: General Atomics` DII-D,...
Plasma processing is used for {approximately}35% of the process steps required for semiconductor man...
Exposure to fine particulate matter smaller than 2.5 μm in diameter (PM 2.5) is linked to increased ...
Dust particle contamination in plasma etching reactors continues to be a major concern to microelect...
There are important safety issues associated with tokamak dust, accumulated primarily from sputterin...
Dust re-suspension and mobilization is one of the more challenging safety issues in industries and f...
Humans and their activities are known to generate considerable amounts of particulate matter indoors...
Abstract: Nanosilica is one of the most widely used nanomaterials across the world. However, their a...
Vacuuming is often promoted as a means of reducing indoor concentrations of settled particles and du...
For particle free vacuum systems, as e.g. systems containing superconducting cavities to be operated...
The accurate determination of dust levels on optical surfaces is necessary to assess sensor system p...
A simple, versatile device for dispersing micrometer‐ and submicrometer-sized particles in vacuum is...