The Particle Cleanliness Validation System (PCVS) is a combination of a surface particle collection tool and a microscope based data, reduction system for determining the particle cleanliness of mechanical and optical surfaces at LLNL. Livermore is currently constructing the National Ignition Facility (NIF), a large 192 beam laser system for studying fusion physics. The laser is entirely enclosed. in aluminum and stainless steel vessels containing several environments; air, argon, and vacuum. It contains uncoated optics as well as hard dielectric coated and softer solgel coated optics which are, to varying degrees, sensitive to opaque particles, translucent particles, and molecular contamination. To quantify the particulate matter on struct...
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the dev...
The feasibility of installing a multi-point particle monitoring system in the Rochester Institute of...
Cleaning processes are a key technology to achieve, restore and guarantee specified product cleanlin...
Dust particle contamination is known to be responsible for reduced quality and yield in microelectro...
With the market introduction of the NXE:3100, Extreme Ultra Violet Lithography (EUVL) enters a new s...
Technical surfaces are found everywhere in the close environment of the critical product. These surf...
Particle free handling of EUV reticles is a major concern in industry. For reaching economically fea...
Cleanliness measurements made on AMPLAB prototype National Ignition Facility (NIF) laser amplifiers ...
Before new equipment for handling of EUV reticles can be used, it should be shown that the apparatus...
Due to absorption of EUV light, EUV reticles are not likely to have pellicles for particulate contam...
The heavy duty Particle Measurement Programme (PMP) inter-laboratory exercise consists of three part...
Clean components guarantee the quality of high-value products. Particulate contaminants have a negat...
The successful acquisition and utilization of piece parts and assemblies for contamination sensitive...
International audienceParticle fallout in cleanrooms is a primary concern for industries manufacturi...
The accurate determination of dust levels on optical surfaces is necessary to assess sensor system p...
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the dev...
The feasibility of installing a multi-point particle monitoring system in the Rochester Institute of...
Cleaning processes are a key technology to achieve, restore and guarantee specified product cleanlin...
Dust particle contamination is known to be responsible for reduced quality and yield in microelectro...
With the market introduction of the NXE:3100, Extreme Ultra Violet Lithography (EUVL) enters a new s...
Technical surfaces are found everywhere in the close environment of the critical product. These surf...
Particle free handling of EUV reticles is a major concern in industry. For reaching economically fea...
Cleanliness measurements made on AMPLAB prototype National Ignition Facility (NIF) laser amplifiers ...
Before new equipment for handling of EUV reticles can be used, it should be shown that the apparatus...
Due to absorption of EUV light, EUV reticles are not likely to have pellicles for particulate contam...
The heavy duty Particle Measurement Programme (PMP) inter-laboratory exercise consists of three part...
Clean components guarantee the quality of high-value products. Particulate contaminants have a negat...
The successful acquisition and utilization of piece parts and assemblies for contamination sensitive...
International audienceParticle fallout in cleanrooms is a primary concern for industries manufacturi...
The accurate determination of dust levels on optical surfaces is necessary to assess sensor system p...
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the dev...
The feasibility of installing a multi-point particle monitoring system in the Rochester Institute of...
Cleaning processes are a key technology to achieve, restore and guarantee specified product cleanlin...